Photosensitive transfer material having a support of defined roughness
    1.
    发明授权
    Photosensitive transfer material having a support of defined roughness 失效
    感光转印材料具有规定的粗糙度的支撑

    公开(公告)号:US4559292A

    公开(公告)日:1985-12-17

    申请号:US537000

    申请日:1983-09-29

    CPC分类号: G03F7/115 G03F7/346

    摘要: The present invention relates to a photosensitive transfer material, which comprises a flexible temporary support film which is preferably transparent, a thermoplastic photosensitive layer, optionally a flexible cover film on the free side of the photosensitive layer and, optionally, an intermediate layer between the support film and the photosensitive layer. The photosensitive transfer material is suitable for manufacturing photoresist stencils and solder masks. The temporary support film has a rough surface which exerts an embossing effect on the surface of the photosensitive layer and the intermediate layer, respectively. The mat-finish of the intermediate layer prevents an irregular deformation of this layer in moist air, while the mat-finish of the photosensitive layer precludes unwanted reflections.

    摘要翻译: 本发明涉及一种感光转印材料,其包括优选透明的柔性临时支撑膜,热敏感光层,可选地在感光层的自由侧上的柔性覆盖膜,以及可选地,在支撑体 胶片和感光层。 感光转印材料适用于制造光刻胶模板和焊接掩模。 临时支撑膜具有分别在感光层和中间层的表面上施加压花效果的粗糙表面。 中间层的表面处理防止了该层在潮湿空气中的不规则变形,而感光层的光洁度则排除了不希望的反射。