发明授权
- 专利标题： Method of pattern detection
- 专利标题（中）： 模式检测方法
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申请号： US689803申请日： 1985-01-08
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公开(公告)号： US4575399A公开(公告)日： 1986-03-11
- 发明人: Toshihiko Tanaka , Norio Hasegawa , Tetsuya Hayashida
- 申请人： Toshihiko Tanaka , Norio Hasegawa , Tetsuya Hayashida
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX59-4813 19840117
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; G03F7/09 ; G03F9/00 ; H01L21/30 ; G03C5/00 ; B05D3/06 ; B32B31/00
摘要：
An anti-reflective coating film is formed on a resist film formed on a substrate having a target pattern formed on its surface, thereby to reduce multiple reflection of light in said resist film. The distortion of the pattern detection signal due to multiple reflection in said resist film is thereby prevented to improve the mask positioning accuracy.
公开/授权文献
- US6058171A Unique ring caller ID 公开/授权日：2000-05-02
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