发明授权
- 专利标题: Perpendicular magnetic recording medium method for producing the same, and sputtering device
- 专利标题(中): 垂直磁记录介质的制造方法及溅射装置
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申请号: US466863申请日: 1983-02-16
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公开(公告)号: US4576700A公开(公告)日: 1986-03-18
- 发明人: Sadao Kadokura , Kazuhiko Honjo , Takashi Tomie , Masahiko Naoe
- 申请人: Sadao Kadokura , Kazuhiko Honjo , Takashi Tomie , Masahiko Naoe
- 申请人地址: JPX Tokyo
- 专利权人: Teijin Limited
- 当前专利权人: Teijin Limited
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX57-22080 19820216
- 主分类号: C23C14/34
- IPC分类号: C23C14/34 ; G11B5/64 ; G11B5/66 ; G11B5/667 ; G11B5/706 ; G11B5/73 ; G11B5/85 ; G11B5/851 ; H01F10/08 ; H01F10/12 ; H01F10/13 ; H01F10/26 ; H01F41/14 ; G11B5/46
摘要:
A magnetic recording medium conventionally utilizes the in-plane magnetization mode, but recently the perpendicular magnetization mode utilizing the perpendicular anisotropy of an hcp cobalt alloy layer, in which the C axis is oriented perpendicular to the layer surface, has been proposed. The known perpendicular magnetic recording medium is produced by means of RF sputtering and comprises a Permalloy layer, as layer of a low coercive-force material, between the nonmagnetic base and the hcp cobalt alloy layer. The perpendicular anisotropy attained by the present invention in very excellent and is superior to that of a perpendicular recording medium having no Permalloy layer because a Co-Ta alloy is used as the layer of a low coercive-force material.
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