发明授权
US4601922A Method of forming a layer of thin film on a substrate having a multiplicity of mesh-like holes 失效
在具有多个网状孔的基板上形成薄膜层的方法

Method of forming a layer of thin film on a substrate having a
multiplicity of mesh-like holes
摘要:
A method of forming a thin layer on a substrate by vapor deposition wherein particles of the material to be constituted the thin layer are caused to fly in such a direction that they reach the surface of the substrate at substantially a right angle relative to the latter. The substrate is located opposite to a particle generating source. A shield device with a slit is provided in the proximity of the substrate located opposite to the particle generating source and between the substrate and the particle generating source so that they are introduced onto the surface of the substrate through the slit at substantially a right angle relative to the surface of the substrate.
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