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US4603340A Semiconductor device having superlattice structure 失效
具有超晶格结构的半导体器件

Semiconductor device having superlattice structure
摘要:
When two indirect only slightly different semiconductor materials having a suitable band gap, for example, AlAs and Al.sub.0.8 Ga.sub.0.2 As, are grown epitaxially one onto the other in layers of a few unit cell layers thick, the electronic band structures are folded so that the indirect minimum of the conduction band is displaced from the edge of the Brillouin zone to the center. The two indirect materials then constitute a superlattice with a band transition with a band gap of 2.2 eV.
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