发明授权
US4609575A Method of apparatus for applying chemicals to substrates in an acid
processing system
失效
在酸处理系统中将化学品施用于基底的设备的方法
- 专利标题: Method of apparatus for applying chemicals to substrates in an acid processing system
- 专利标题(中): 在酸处理系统中将化学品施用于基底的设备的方法
-
申请号: US626640申请日: 1984-07-02
-
公开(公告)号: US4609575A公开(公告)日: 1986-09-02
- 发明人: Don C. Burkman
- 申请人: Don C. Burkman
- 申请人地址: MN Chaska
- 专利权人: FSI Corporation
- 当前专利权人: FSI Corporation
- 当前专利权人地址: MN Chaska
- 主分类号: C23G3/00
- IPC分类号: C23G3/00 ; B01F5/02 ; B05B7/08 ; C23F1/16 ; C23G1/00 ; C30B33/00 ; C30B33/10 ; H01L21/00 ; H01L21/306 ; B05B13/02 ; B05B15/06
摘要:
In acid processing of substrates, such as silicon wafers in the manufacture of electronic devices, such as integrated circuit chips, the method of mixing separate chemicals together in the processing chambers and as the separate chemicals are sprayed in atomized and directional spray patterns toward and across the surfaces of the substrates, the directional spray patterns emanating from different sources and having oblique directions with respect to each other to traverse each other at the surfaces of the substrates for thorough mixing and immediate application to the wafer faces to accomplish the processing. A vented housing defines the processing chamber with spray posts spaced from each other around the periphery of the housing and mounted on the sidewall and directing atomized liquid chemical sprays toward the center at which the substrates are mounted as to cause the spray patterns to traverse each other as they sweep across the wafers.
公开/授权文献
- USD336004S Espresso making machine 公开/授权日:1993-06-01
信息查询