发明授权
- 专利标题: Antifungal compositions
- 专利标题(中): 抗真菌组合物
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申请号: US650053申请日: 1984-09-13
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公开(公告)号: US4621090A公开(公告)日: 1986-11-04
- 发明人: Kazuo Iwata , Tetsuo Takematsu , Yuji Nonaka , Akira Nakanishi , Hideo Morinaka , Kenji Tsuzuki , Mitsuyuki Murakami , Takeshi Uotani
- 申请人: Kazuo Iwata , Tetsuo Takematsu , Yuji Nonaka , Akira Nakanishi , Hideo Morinaka , Kenji Tsuzuki , Mitsuyuki Murakami , Takeshi Uotani
- 申请人地址: JPX Shinnanyo
- 专利权人: Toyo Soda Manufacturing Co., Ltd.
- 当前专利权人: Toyo Soda Manufacturing Co., Ltd.
- 当前专利权人地址: JPX Shinnanyo
- 优先权: JPX58-167415 19830913
- 主分类号: A61K31/27
- IPC分类号: A61K31/27 ; A01N47/18 ; A01N47/22 ; A61K31/44 ; A61K31/4402 ; A61K31/4418 ; A61K31/47 ; A61P31/00 ; A61P31/04 ; A61P31/10 ; C07D213/75 ; C07D215/22 ; C07D401/12 ; C07D405/12
摘要:
An antifungal composition comprising an effective amount of carbamate derivative having the formula (I): ##STR1## where X is 2-naphthyl, 5-indanyl, 5,6,7,8-tetrahydro-2-naphthyl, 1,4-methano-1,2,3,4-tetrahydro-6-naphthyl, 1,4-ethano-1,2,3,4-tetrahydro-6-naphthyl, 2-quinolyl, or a phenyl group having one or two of the same or different substituents selected from the group of halogen atom, lower alkyl, lower alkenyl, lower alkoxy, lower alkenyloxy, halogenated lower alkyl, lower alkylthio, lower alkylsulfonyl, lower alkylamino, nitro, and methylenedioxy;Y is an oxygen atom or a sulfur atom;Z is lower alkyl group;W is pyridyl group having one or two of the same substituents selected from the group of lower alkyl, lower alkoxy, lower alkenyloxy, and lower alkylamino.
公开/授权文献
- US5653004A Plastic clip 公开/授权日:1997-08-05
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