Invention Grant
- Patent Title: Photopolymerizable recording material suitable for the production of photoresist layers
- Patent Title (中): 可光聚合记录材料适用于生产光刻胶层
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Application No.: US565929Application Date: 1983-12-27
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Publication No.: US4632897APublication Date: 1986-12-30
- Inventor: Helmut Barzynski , Albrecht Eckell , Albert Elzer , Uwe Klinsmann , Reinhold J. Leyrer , Axel Sanner
- Applicant: Helmut Barzynski , Albrecht Eckell , Albert Elzer , Uwe Klinsmann , Reinhold J. Leyrer , Axel Sanner
- Applicant Address: DEX Ludwigshafen
- Assignee: BASF Aktiengesellschaft
- Current Assignee: BASF Aktiengesellschaft
- Current Assignee Address: DEX Ludwigshafen
- Priority: DEX3131448 19810807
- Main IPC: G03F7/032
- IPC: G03F7/032 ; G03F7/033 ; H05K3/00 ; G03C1/70 ; G03C1/76
Abstract:
Photopolymerizable recording materials which are suitable for the production of photoresist layers, and contain one or more thermoplastic vinyl polymers as the binder, one or more low molecular weight, ethylenically unsaturated, photopolymerizable compounds and one or more photoinitiators, with or without other, conventional additives and/or assistants, have excellent adhesion to metallic substrate surfaces if the binder employed is a vinyl polymer which possesses amino and/or imino groups.
Public/Granted literature
- US5592669A File structure for a non-volatile block-erasable semiconductor flash memory Public/Granted day:1997-01-07
Information query
IPC分类: