发明授权
- 专利标题: Photopolymerizable recording material suitable for the production of photoresist layers
- 专利标题(中): 可光聚合记录材料适用于生产光刻胶层
-
申请号: US565929申请日: 1983-12-27
-
公开(公告)号: US4632897A公开(公告)日: 1986-12-30
- 发明人: Helmut Barzynski , Albrecht Eckell , Albert Elzer , Uwe Klinsmann , Reinhold J. Leyrer , Axel Sanner
- 申请人: Helmut Barzynski , Albrecht Eckell , Albert Elzer , Uwe Klinsmann , Reinhold J. Leyrer , Axel Sanner
- 申请人地址: DEX Ludwigshafen
- 专利权人: BASF Aktiengesellschaft
- 当前专利权人: BASF Aktiengesellschaft
- 当前专利权人地址: DEX Ludwigshafen
- 优先权: DEX3131448 19810807
- 主分类号: G03F7/032
- IPC分类号: G03F7/032 ; G03F7/033 ; H05K3/00 ; G03C1/70 ; G03C1/76
摘要:
Photopolymerizable recording materials which are suitable for the production of photoresist layers, and contain one or more thermoplastic vinyl polymers as the binder, one or more low molecular weight, ethylenically unsaturated, photopolymerizable compounds and one or more photoinitiators, with or without other, conventional additives and/or assistants, have excellent adhesion to metallic substrate surfaces if the binder employed is a vinyl polymer which possesses amino and/or imino groups.
公开/授权文献
信息查询
IPC分类: