发明授权
- 专利标题： Process for producing novel photosensitive resins
- 专利标题（中）： 新型感光性树脂的制造方法
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申请号： US881919申请日： 1986-07-03
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公开(公告)号： US4701497A公开(公告)日： 1987-10-20
- 发明人: Hajime Serizawa , Keizo Ogihara , Kiyoshi Shimizu , Susumu Harada
- 申请人： Hajime Serizawa , Keizo Ogihara , Kiyoshi Shimizu , Susumu Harada
- 申请人地址： JPX Fukushima
- 专利权人： Nitto Boseki Co., Limited
- 当前专利权人： Nitto Boseki Co., Limited
- 当前专利权人地址： JPX Fukushima
- 优先权： JPX60-148036 19850705
- 主分类号： C08F8/00
- IPC分类号： C08F8/00 ; G03F7/004 ; G03F7/038 ; H01L21/027 ; H05K3/00 ; C08F271/00
摘要：
A process for producing a novel photosensitive resin having cinnamic groups, comprising reacting a polyallylamine represented by the general formula (I) ##STR1## (wherein n is at least 10) or an inorganic acid salt thereof with a compound having a cinnamic group in the presence of a solvent. The process is free from drawbacks as experienced in the production of a conventional photosensitive resin (e.g. polyvinyl cinnamate), such as formation of by-products during the polymerization of a monomer (e.g. vinyl cinnamate).
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