发明授权
US4728594A Photosensitive composition with azide or bisazide compound with
oxazolone group
失效
具有叠氮化物或双叠氮化合物与恶唑酮基团的光敏组合物
- 专利标题： Photosensitive composition with azide or bisazide compound with oxazolone group
- 专利标题（中）： 具有叠氮化物或双叠氮化合物与恶唑酮基团的光敏组合物
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申请号： US818686申请日： 1986-01-14
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公开(公告)号： US4728594A公开(公告)日： 1988-03-01
- 发明人: Saburo Nonogaki , Ryotaro Irie , Michiaki Hashimoto , Takao Iwayanagi
- 申请人： Saburo Nonogaki , Ryotaro Irie , Michiaki Hashimoto , Takao Iwayanagi
- 申请人地址： JPX
- 专利权人： Hitachi Chemical Co., Ltd.
- 当前专利权人： Hitachi Chemical Co., Ltd.
- 当前专利权人地址： JPX
- 优先权： JPX60-5756 19850118
- 主分类号： G03C5/08
- IPC分类号： G03C5/08 ; C07D263/38 ; G03F7/004 ; G03F7/008 ; G03F7/038 ; G03C1/52 ; G03C1/71
摘要：
A photosensitive composition comprising an azide compound represented by the formula: ##STR1## wherein each of X and Y is an aromatic substituent group, at least one of X and Y being an aromatic substituent group having an azide group, and n and m are zeros or integers of 1, and a polymeric compound. Since this composition has high resolution and is photosensitive to light having a wavelength of 436 nm, it permits employment of a reduction projection printer and is suitable for fabrication of semiconductor devices.
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