Photosensitive composition
    4.
    发明授权
    Photosensitive composition 失效
    感光组合物

    公开(公告)号:US4792516A

    公开(公告)日:1988-12-20

    申请号:US373

    申请日:1987-01-05

    CPC分类号: G03F7/0166 G03F7/0085

    摘要: A photosensitive composition comprising (a) a photosensitive component such as an aromatic diazo compound or an aromatic azide, (b) a polymer and (c) a quaternary alkylammonium salt wherein each straight- or branched-chain alkyl group has 1 to 7 carbon atoms is suitable for producing a positive type or negative type photresist excellent in contrast and sensitivity in the microlithography of semiconductor elements.

    摘要翻译: 一种光敏组合物,其包含(a)光敏组分如芳族重氮化合物或芳族叠氮化物,(b)聚合物和(c)季烷基铵盐,其中每个直链或支链烷基具有1至7个碳原子 适用于制造在半导体元件的微光刻中对比度和灵敏度优异的正型或负型光电阻。