发明授权
US4745360A Electron-beam probe system utilizing test device having interdigitated
conductive pattern and associated method of using the test device
失效
电子束探针系统利用具有交叉指导图案的测试装置和使用测试装置的相关方法
- 专利标题: Electron-beam probe system utilizing test device having interdigitated conductive pattern and associated method of using the test device
- 专利标题(中): 电子束探针系统利用具有交叉指导图案的测试装置和使用测试装置的相关方法
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申请号: US858613申请日: 1986-05-01
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公开(公告)号: US4745360A公开(公告)日: 1988-05-17
- 发明人: Jan D. Reimer , Victor R. Akylas
- 申请人: Jan D. Reimer , Victor R. Akylas
- 申请人地址: CA Sunnyvale
- 专利权人: North American Phillips Corporation, Signetics Division
- 当前专利权人: North American Phillips Corporation, Signetics Division
- 当前专利权人地址: CA Sunnyvale
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; G01Q30/02 ; G01R31/26 ; G01R31/302 ; G01R31/305 ; G01R31/3183 ; H01J37/28 ; G01R19/00 ; G01R35/00
摘要:
A test device (40) has a patterned conductive layer (42 or 44) particularly adapted for use in an E-beam probe system (FIG. 3) to study how local electric fields influence probe voltage measurements. The layer is composed of two or more conductors (A and B.sub.J C and D.sub.J) separated from each other. Each conductor has a group of fingers. The fingers (F1.sub.p, F0.sub.p, F2, F0.sub.Q and F1.sub.Q) run parallel to one another and are at least partially interdigitated. The width of each finger is constant along its length. The widths of the fingers and the spacings between them vary from finger to finger according to a selected pattern.
公开/授权文献
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