发明授权
- 专利标题: Multi quantum well laser with parallel injection
- 专利标题(中): 多量子阱激光器并行注入
-
申请号: US898199申请日: 1986-08-20
-
公开(公告)号: US4752934A公开(公告)日: 1988-06-21
- 发明人: Tadashi Fukuzawa , Naoki Chinone , Kazuhisa Uomi , Takashi Kajimura
- 申请人: Tadashi Fukuzawa , Naoki Chinone , Kazuhisa Uomi , Takashi Kajimura
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX60-206444 19850920
- 主分类号: H01S5/00
- IPC分类号: H01S5/00 ; H01S3/00 ; H01S5/02 ; H01S5/042 ; H01S5/20 ; H01S5/343 ; H01S3/19
摘要:
A semiconductor laser having such a structure that a laser structure including a laser active region of multi quantum well structure, cladding layers and a cap layer is formed on a substrate, is disclosed in which both end regions of the laser active region in the quantum well layer is converted into mixed crystal by impurity induced intermixing so that a multi quantum well active region is sandwiched between mixed crystal regions, and impurity diffused regions are formed between the surface of the crystal and the mixed crystal regions, to form a current path and to inject carriers into the multi quantum well region in a direction parallel to the laser active layer. Thus, the semiconductor laser can modulate laser oscillation at a very high frequency, and moreover is readily fabricated or integrated.
公开/授权文献
信息查询