发明授权
- 专利标题: Method for purifying hexamethyldisiloxane
- 专利标题(中): 六甲基二硅氧烷的纯化方法
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申请号: US148414申请日: 1988-01-26
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公开(公告)号: US4774346A公开(公告)日: 1988-09-27
- 发明人: Takeshi Imai , Masahiko Suzuki , Ikuzo Takahashi , Shuzo Toida
- 申请人: Takeshi Imai , Masahiko Suzuki , Ikuzo Takahashi , Shuzo Toida
- 申请人地址: JPX Tokyo
- 专利权人: Toray Silicone Co., Ltd.
- 当前专利权人: Toray Silicone Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-23325 19870203
- 主分类号: C07F7/08
- IPC分类号: C07F7/08 ; C07F7/20
摘要:
A method for purifying impure hexamethyldisiloxane comprising as a major portion hexamethyldisiloxane and as a minor portion a mixture of low-boiling organic solvents, other organosilicon compounds, and odor-producing materials is described. The method comprises (A) first, treating the impure hexamethyldisiloxane with a condensation catalyst to convert the organosilicon compounds to additional hexamethyldisiloxane; (B) second, washing the treated impure hexamethyldisiloxane with water; (C) third, separating a water phase from the washed impure hexamethyldisiloxane; (D) fourth, distilling the washed impure hexamethyldisiloxane to yield hexamethyldisiloxane of enhanced purity; (E) fifth, contacting the hexamethyldisiloxane of enhanced purity with acid clay at a temperature of greater than about 50.degree. C.; and (F) finally, contacting the acid clay treated hexamethyldisiloxane of enhanced purity treated in (E) with activated carbon to yield hexamethyldisiloxane with enhanced purity and minimal unpleasant odor.
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