发明授权
- 专利标题: Method of and apparatus for detecting pattern defects
- 专利标题(中): 检测图案缺陷的方法和装置
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申请号: US940272申请日: 1986-12-10
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公开(公告)号: US4803734A公开(公告)日: 1989-02-07
- 发明人: Hiroyuki Onishi , Tetsuo Sano , Tetsuo Hoki , Eiji Kodama , Hisayuki Tsujinaka , Ryuji Kitakado
- 申请人: Hiroyuki Onishi , Tetsuo Sano , Tetsuo Hoki , Eiji Kodama , Hisayuki Tsujinaka , Ryuji Kitakado
- 申请人地址: JPX Kyoto
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JPX Kyoto
- 优先权: JPX60-281558 19851213
- 主分类号: H04N7/18
- IPC分类号: H04N7/18 ; G01B11/24 ; G01B11/30 ; G06K9/64 ; G06T1/00 ; G06T7/00 ; H05K3/00
摘要:
The periphery of an area of a master pattern is expanded by a required number of pixels to define a plurality of master pattern areas two-dimensionally misregistered pixel by pixel, for performing pattern comparison of the respective master pattern areas with an area of an object pattern. The object pattern is deemed defective when all of the comparisons indicate pattern mismatches. The pattern is deemed not defective when at least one comparison indicates a pattern match. Thus, even if an inspected object includes misregistration errors, pattern defects can be detected with high accuracy.
公开/授权文献
- US6021390A Information selling method and information selling system 公开/授权日:2000-02-01
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