公开(公告)号：US20060032520A1

公开(公告)日：2006-02-16

申请号：US11249444

申请日：2005-10-14

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B08B3/00

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

摘要翻译： 高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。 流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

公开(公告)号：US07252719B2

公开(公告)日：2007-08-07

申请号：US11249444

申请日：2005-10-14

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B08B3/02

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

摘要翻译： 高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。 流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

公开(公告)号：US06691430B2

公开(公告)日：2004-02-17

申请号：US10382616

申请日：2003-03-04

申请人： Kimitsugu Saito ,  Yusuke Muraoka ,  Ryuji Kitakado ,  Takashi Miyake ,  Tomomi Iwata ,  Ikuo Mizobata

发明人： Kimitsugu Saito ,  Yusuke Muraoka ,  Ryuji Kitakado ,  Takashi Miyake ,  Tomomi Iwata ,  Ikuo Mizobata

IPC分类号： F26B700

CPC分类号： H01L21/67034 ,  Y10S134/902

摘要： Liquid for prevention of substrate drying is supplied into a processing chamber so that a pool of the liquid is created as an anti-drying atmosphere in advance inside a processing chamber, and substrates, as they are dipped in the pool, are kept on stand-by in a substrate board. In this manner, air drying of the substrates which are kept on stand-by is prevented. When the number of the substrates in the substrate board reaches a certain number, the anti-drying atmosphere is removed from the processing chamber, which is followed by introduction of an SCF into the processing chamber and supercritical drying (high pressure drying) of all of the plurality of substrates inside the processing chamber, namely, batch supercritical drying.

摘要翻译： 将用于防止基材干燥的液体供应到处理室中，使得在处理室内预先产生作为防干燥气氛的液体池，并且当浸入池中时，将基板保持在待机状态， 通过在衬底板中。 以这种方式，防止了保持待机的基板的空气干燥。 当基板中的基板数量达到一定数量时，从处理室中除去防干燥气氛，然后将SCF引入处理室，并将超临界干燥（高压干燥）全部 处理室内的多个基板，即分批超临界干燥。

公开(公告)号：US5161202A

公开(公告)日：1992-11-03

申请号：US731851

申请日：1991-07-16

申请人： Ryuji Kitakado ,  Hironobu Yano ,  Tetsuo Hoki

发明人： Ryuji Kitakado ,  Hironobu Yano ,  Tetsuo Hoki

IPC分类号： G01B11/24 ,  G01B11/245 ,  G01N21/88 ,  G01N21/93 ,  G01N21/956 ,  G01R31/308 ,  G06T1/00 ,  G06T7/00 ,  H05K3/00

CPC分类号： G06T7/001 ,  G01R31/308 ,  G06T2207/30141

摘要： Respective images of a conductive pattern and through holes of a printed circuit board are obtained. The through holes are classified into normal through holes having a relatively large diameter and mini via holes having a comparatively small diameter. The mini via hole image is enlarged to become an enlarged mini via hole image (SHSm). The image of the conductive pattern has hole parts therein, which are filled with images generated from the normal through hole image and the mini via hole image to obtain a corrected pattern image (CPS). The edge of the corrected pattern image is detected and enlarged to obtain an enlarged edge image (SES). The enlarged edge image is classified into two areas, one of which overlaps with the enlarged mini via hole image (SHSm). These two areas are subjected to inspection in different inspection modes.

公开(公告)号：US5144681A

公开(公告)日：1992-09-01

申请号：US674546

申请日：1991-03-22

申请人： Ryuji Kitakado ,  Hironobu Yano ,  Hiroaki Kakuma ,  Tetsuo Hoki ,  Takao Kanai

发明人： Ryuji Kitakado ,  Hironobu Yano ,  Hiroaki Kakuma ,  Tetsuo Hoki ,  Takao Kanai

IPC分类号： G06T7/00

CPC分类号： G06T7/0006 ,  G06T2207/30141

摘要： A printed circuit board (11) is provided with a conductive pattern (P, R) and a through hole (H) thereon. Respective images of the conductive pattern and a through hole are photoelectrically read with an image reader (20). The conductive pattern image is magnified in size to obtain a magnified pattern image (PI.sub.m), while the hole image is magnified at different magnification factors to obtain magnified hole images (HI.sub.n, HI.sub.n-i). A ring image (RP) is defined by the difference of the magnified hole images. The overlapped region (WR) on which the ring image and the magnified pattern image overlap each other is then calculated, and a defect or an opening of the conductive pattern is detected by calculating the aperture angle (.theta.) of the overlapped image.

摘要翻译： 印刷电路板（11）上设有导电图案（P，R）和通孔（H）。 用图像读取器（20）对导电图案和通孔的各个图像进行光电读取。 导电图案图像的大小被放大以获得放大的图案图像（PIm），而孔图像以不同的放大系数放大以获得放大的孔图像（HIn，HIn-i）。 环形图像（RP）由放大孔图像的差定义。 然后计算环形图像和放大图案图像重叠的重叠区域（WR），并且通过计算重叠图像的孔径角度（θ）来检测导电图案的缺陷或开口。

公开(公告)号：US5027417A

公开(公告)日：1991-06-25

申请号：US500294

申请日：1990-03-27

申请人： Ryuji Kitakado ,  Hironobu Yano ,  Hiroaki Kakuma ,  Tetsuo Hoki ,  Takao Kanai

发明人： Ryuji Kitakado ,  Hironobu Yano ,  Hiroaki Kakuma ,  Tetsuo Hoki ,  Takao Kanai

IPC分类号： G06T7/00

CPC分类号： G06T7/0006 ,  G06T2207/30141

摘要： A printed circuit board (11) is provided with a conductive pattern (P, R) and a through hole (H) thereon. Respective images of the conductive pattern and a through hole are photoelectrically read with an image reader (20). The conductive pattern image is magnified in size to obtain a magnified pattern image (PI.sub.m), while the hole image is magnified at different magnification factors to obtain magnified hole images (HI.sub.n, HI.sub.n-i). A ring image (RP) is defined by the difference of the magnified hole images. The overlapped region (WR) on which the ring image and the magnified pattern image overlap each other is then calculated, and a defect or an opening of the conductive pattern is detected by calculating the aperture angle (.theta.) of the overlapped image.

公开(公告)号：US06841031B2

公开(公告)日：2005-01-11

申请号：US10201383

申请日：2002-07-23

申请人： Tomomi Iwata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Takashi Miyake ,  Ryuji Kitakado

发明人： Tomomi Iwata ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Takashi Miyake ,  Ryuji Kitakado

IPC分类号： G03F7/30 ,  B65G49/07 ,  C03C15/00 ,  C03C23/00 ,  G03F7/40 ,  H01L21/00 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306

CPC分类号： H01L21/67161 ,  C03C15/00 ,  C03C23/0075 ,  C03C23/0085 ,  H01L21/67173

摘要： With respect to any one of processing units, a main transportation path, a developing unit, a dedicated transportation robot and a high-pressure processing unit are disposed linearly in this order in a direction. Hence, even if a processing fluid adhering to a substrate or an evaporant of the processing fluid moves toward the main transportation path while the high-pressure processing unit transports the substrate wet with the processing fluid, there are the processing units located which the processing fluid or its evaporant must arrive at before reaching the main transportation path.

摘要翻译： 对于处理单元中的任何一个，主传送路径，显影单元，专用传送机器人和高压处理单元在该方向上以该顺序线性地设置。 因此，即使附着在处理液的基板或蒸发剂上的处理流体朝着主输送路径移动，而高压处理单元用处理流体输送基板，则存在处理单元，处理流体 或其蒸发器必须在到达主要运输路径之前到达。

公开(公告)号：US06703316B2

公开(公告)日：2004-03-09

申请号：US10132212

申请日：2002-04-26

申请人： Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Nobuyuki Kawakami ,  Takahiko Ishii ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Ikuo Mizobata ,  Takashi Miyake ,  Ryuji Kitakado

发明人： Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Nobuyuki Kawakami ,  Takahiko Ishii ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Ikuo Mizobata ,  Takashi Miyake ,  Ryuji Kitakado

IPC分类号： H01L21302

CPC分类号： H01L21/02052 ,  H01L21/67028

摘要： A method and system for processing a substrate includes performing a wet process by supplying a working liquid to a substrate in a wet processing apparatus, transferring the substrate in a non-dry state from the wet processing apparatus to a drying apparatus, and subjecting the substrate to a supercritical drying by a supercritical fluid in the drying apparatus.

摘要翻译： 用于处理衬底的方法和系统包括通过在湿法处理设备中将工作液体供应到衬底来进行湿法处理，将非干燥状态的衬底从湿法处理设备转移到干燥设备，并对衬底 在干燥装置中通过超临界流体进行超临界干燥。

公开(公告)号：US4803734A

公开(公告)日：1989-02-07

申请号：US940272

申请日：1986-12-10

申请人： Hiroyuki Onishi ,  Tetsuo Sano ,  Tetsuo Hoki ,  Eiji Kodama ,  Hisayuki Tsujinaka ,  Ryuji Kitakado

发明人： Hiroyuki Onishi ,  Tetsuo Sano ,  Tetsuo Hoki ,  Eiji Kodama ,  Hisayuki Tsujinaka ,  Ryuji Kitakado

IPC分类号： H04N7/18 ,  G01B11/24 ,  G01B11/30 ,  G06K9/64 ,  G06T1/00 ,  G06T7/00 ,  H05K3/00

CPC分类号： G06T7/001 ,  G01N21/956 ,  G06K9/6203 ,  G03F1/84 ,  G06T2207/30141 ,  G06T2207/30148

摘要： The periphery of an area of a master pattern is expanded by a required number of pixels to define a plurality of master pattern areas two-dimensionally misregistered pixel by pixel, for performing pattern comparison of the respective master pattern areas with an area of an object pattern. The object pattern is deemed defective when all of the comparisons indicate pattern mismatches. The pattern is deemed not defective when at least one comparison indicates a pattern match. Thus, even if an inspected object includes misregistration errors, pattern defects can be detected with high accuracy.

摘要翻译： 主图案的区域的周边被扩展所需数量的像素以限定像素逐个二维不对准的多个主图案区域，用于执行各个主图案区域与对象图案的区域的图案比较 。 当所有比较指示图案不匹配时，对象图案被认为是有缺陷的。 当至少一个比较表示模式匹配时，该模式被认为没有缺陷。 因此，即使检查对象包括不对准误差，也可以高精度地检测图案缺陷。

公开(公告)号：US4797939A

公开(公告)日：1989-01-10

申请号：US914863

申请日：1986-10-02

申请人： Tetsuo Hoki ,  Tetsuo Sano ,  Ryuji Kitakado ,  Yoshinori Sezaki ,  Tomiji Hotta ,  Hironobu Yano

发明人： Tetsuo Hoki ,  Tetsuo Sano ,  Ryuji Kitakado ,  Yoshinori Sezaki ,  Tomiji Hotta ,  Hironobu Yano

IPC分类号： G01N21/956 ,  G06T7/00 ,  G06K9/00

CPC分类号： G06T7/001 ,  G01N21/956 ,  G06T2207/30141

摘要： A binarized image data group of an inspected object for a plurality of pixels arrayed in the sub-scanning direction is sequentially created in order along the main scanning direction to determine whether or not the pattern of an inputted image corresponds to a standard through-hole pattern on the basis of the binarized image data group. When the determination is of yes, through-hole diameter masking data are sequentially created in order along the main scanning direction to sequentially perform masking processing on the binarized image data group of the inspected object arrayed in the sub-scanning direction. Thus, the through-hole pattern is automatically detected to be subjected to masking processing, whereby an inspected object having through-holes can be inspected by a pattern matching method.

摘要翻译： 沿着主扫描方向顺序地创建沿副扫描方向排列的多个像素的检查对象的二值化图像数据组，以确定输入图像的图案是否对应于标准通孔图案 在二值化图像数据组的基础上。 当确定为是时，沿着主扫描方向依次创建通孔直径掩蔽数据，以顺序对沿副扫描方向排列的被检查对象的二值化图像数据组执行掩蔽处理。 因此，通孔图案被自动检测以进行掩模处理，从而可以通过图案匹配方法检查具有通孔的检查对象。