发明授权
US4822721A A method of image-wise exposing and developing halogen-containing
polyacrylate derivatives
失效
一种成像曝光和开发含卤素的聚丙烯酸酯衍生物的方法
- 专利标题： A method of image-wise exposing and developing halogen-containing polyacrylate derivatives
- 专利标题（中）： 一种成像曝光和开发含卤素的聚丙烯酸酯衍生物的方法
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申请号： US123799申请日： 1987-11-23
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公开(公告)号： US4822721A公开(公告)日： 1989-04-18
- 发明人: Yoshitaka Tsutsumi , Toru Seita , Hideo Shuyama , Kousaburou Matsumura , Kyoko Nakazawa
- 申请人： Yoshitaka Tsutsumi , Toru Seita , Hideo Shuyama , Kousaburou Matsumura , Kyoko Nakazawa
- 申请人地址： JPX Shin-nanyo
- 专利权人： Toyo Soda Manufacturing Co., Ltd.
- 当前专利权人： Toyo Soda Manufacturing Co., Ltd.
- 当前专利权人地址： JPX Shin-nanyo
- 优先权： JPX60-290823 19851225; JPX61-84172 19860414; JPX61-109621 19860515; JPX61-211488 19860910; JPX61-21401 19860912; JPX61-270891 19861115
- 主分类号： C08F20/22
- IPC分类号： C08F20/22 ; G03F7/039 ; G03C5/00
摘要：
Halogen-containing polyacrylate derivatives having the formula: ##STR1## wherein A is a structural unit derived from a copolymeriazable monomer having a double bond; R is ##STR2## wherein each of R.sub.1 and R.sub.2 is a hydrogen atom or a fluorinated methyl group, provided R.sub.1 and R.sub.2 are not hydrogen atoms at the same time, and R.sub.3 is a hydrogen atom or a lower alkyl group; X is a halogen atom or a methyl group; and m is a positive integer, n is 0 or a positive integer, and n/m from 0 to 2, preferably from 0 to 1 are disclosed.Also disclosed are methods for forming a resist pattern by using the halogen-containing polyacrylate derivatives as a resist material.