Invention Grant
- Patent Title: Process for cleaning an exhaust gas
- Patent Title (中): 净化废气的方法
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Application No.: US127609Application Date: 1987-11-30
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Publication No.: US4828806APublication Date: 1989-05-09
- Inventor: Claus Flockenhaus , Karl H. Laue , Theo Sander , Erich Hackler , Blagoje Levkov , Daniel Grimm , Hartmut Kainer , Hermann Stein
- Applicant: Claus Flockenhaus , Karl H. Laue , Theo Sander , Erich Hackler , Blagoje Levkov , Daniel Grimm , Hartmut Kainer , Hermann Stein
- Applicant Address: DEX Wiesbaden DEX Essen
- Assignee: Didier Werke AG,Didier Engineering GmbH
- Current Assignee: Didier Werke AG,Didier Engineering GmbH
- Current Assignee Address: DEX Wiesbaden DEX Essen
- Priority: DEX3430870 19840822
- Main IPC: B01D53/86
- IPC: B01D53/86 ; F23J15/00
Abstract:
In a process for cleaning a waste gas containing various pollutants, the exhaust gas with the pollutants is introduced directly into a reduction reactor. In the reactor, the pollutants are reduced by ammonia. The catalyst used is iron oxide material or a mixed oxide material of iron oxide and chromium oxide, or a mixture of the mixture material of the mixed oxide material and the iron oxide material.
Public/Granted literature
- US5986336A Semiconductor device including a heat radiation plate Public/Granted day:1999-11-16
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