发明授权
- 专利标题: Process for defining organic sidewall structures
- 专利标题(中): 定义有机侧壁结构的方法
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申请号: US218515申请日: 1988-06-20
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公开(公告)号: US4838991A公开(公告)日: 1989-06-13
- 发明人: William J. Cote , Donald M. Kenney , Michael L. Kerbaugh , Michael A. Leach , Jeffrey A. Robinson , Robert W. Sweetser
- 申请人: William J. Cote , Donald M. Kenney , Michael L. Kerbaugh , Michael A. Leach , Jeffrey A. Robinson , Robert W. Sweetser
- 申请人地址: NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: NY Armonk
- 主分类号: H01L21/027
- IPC分类号: H01L21/027 ; H01L21/311 ; H01L21/3213
摘要:
A conformal organic layer is used to define spacers on the sidewalls of an organic mandrel. The organic layer (e.g., parylene) can be deposited at low temperatures, and as such is compatible with temperature-sensitive mandrel materials that reflow at high deposition temperatures. The conformal organic material can be dry etched as the same rate as the organic mandrels, while being resistant to wet strip solvents that remove the organic mandrels. This series of etch characteristics make the organic mandrel-organic spacer combination compatible with a host of masking applications.
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