发明授权
- 专利标题: Ion implant using tetrafluoroborate
- 专利标题(中): 离子注入使用四氟硼酸盐
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申请号: US190815申请日: 1988-05-06
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公开(公告)号: US4851255A公开(公告)日: 1989-07-25
- 发明人: Andre Lagendijk , Shantia Riahi
- 申请人: Andre Lagendijk , Shantia Riahi
- 申请人地址: PA Allentown
- 专利权人: Air Products and Chemicals, Inc.
- 当前专利权人: Air Products and Chemicals, Inc.
- 当前专利权人地址: PA Allentown
- 主分类号: H01J27/02
- IPC分类号: H01J27/02
摘要:
Metal tetrafluoroborates, alkali and alkaline earth tetrafluoroborates in particular, and preferably lithium tetrafluoroborate are used as ion source materials in ion implantation of semiconductor materials with boron.
公开/授权文献
- US6080667A Method of treating CVD titanium nitride with silicon ions 公开/授权日:2000-06-27