发明授权
- 专利标题： Silicon-containing polymers as resists
- 专利标题（中）： 含硅聚合物作为抗蚀剂
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申请号： US79661申请日： 1987-07-31
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公开(公告)号： US4863834A公开(公告)日： 1989-09-05
- 发明人: Gregory L. Baker , Murrae J. S. Bowden , Antoni S. Gozdz , Cynthia F. Klausner
- 申请人： Gregory L. Baker , Murrae J. S. Bowden , Antoni S. Gozdz , Cynthia F. Klausner
- 申请人地址： NJ Livingston
- 专利权人： Bell Communications Research, Inc.
- 当前专利权人： Bell Communications Research, Inc.
- 当前专利权人地址： NJ Livingston
- 主分类号： C08F8/20
- IPC分类号： C08F8/20 ; G03F7/075
摘要：
A sensitive deep utltraviolet radiation resist suitable for use in two layer lithography is obtained by brominating poly (1-trimethylsilylpropyne). Positive patterned layers are obtained by coating a substrate with the polymer, irradiating it with ultraviolet radiation, baking the polymer and developing the irradiated portions.
公开/授权文献
- US5362906A Farnesyl pyrophosphate analogs 公开/授权日：1994-11-08
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