发明授权
- 专利标题: Method of sythesizing carbon film and carbon particles in a vapor phase
- 专利标题(中): 气相中碳膜和碳颗粒的交联方法
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申请号: US765573申请日: 1985-08-14
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公开(公告)号: US4873115A公开(公告)日: 1989-10-10
- 发明人: Mitsuo Matsumura , Toshihiko Yoshida
- 申请人: Mitsuo Matsumura , Toshihiko Yoshida
- 申请人地址: JPX Tokyo
- 专利权人: Toa Nenryo Kogyo K.K.
- 当前专利权人: Toa Nenryo Kogyo K.K.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX57-141559 19820813
- 主分类号: C01B31/02
- IPC分类号: C01B31/02 ; C01B31/06 ; C23C16/26 ; C23C16/27 ; C30B25/02 ; C30B29/04
摘要:
A vapor phase synthesis of carbon film and carbon particles using a single or a mixed gas capable of supplying halogen, hydrogen and carbon atoms is disclosed. Halogen radicals can suppress the desorption of carbon atoms from the substrate, and the carbon layer is obtained easily. Especially chlorine and fluorine atoms are effective. An electron beam diffraction pattern illustrated that diamond film can be obtained in this method.
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