发明授权
- 专利标题: Ion beam irradiating apparatus including ion neutralizer
- 专利标题(中): 离子束照射装置,包括离子中和剂
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申请号: US165957申请日: 1988-03-09
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公开(公告)号: US4886971A公开(公告)日: 1989-12-12
- 发明人: Yasushi Matsumura , Akira Shuhara , Shigeo Sasaki , Kazumi Fukumoto , Hitoshi Takeya
- 申请人: Yasushi Matsumura , Akira Shuhara , Shigeo Sasaki , Kazumi Fukumoto , Hitoshi Takeya
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-59522 19870313; JPX62-59523 19870313; JPX62-62896 19870317; JPX62-62900 19870317; JPX62-39686[U] 19870317
- 主分类号: G01Q30/20
- IPC分类号: G01Q30/20 ; G01Q70/14 ; G21K5/04 ; H01J37/02
摘要:
In an ion beam irradiating apparatus, a specified ion beam is first deflected in a deflection direction perpendicular to an ion beam orbit by an ion beam deflector. The deflected ion beam is neutralized by a thermoelectron beam emitted from a filament of an ion neutralizer. An electrode is employed to control the supply of the thermoelectron beam to the deflected ion beam. Both the filament and control electrode elongated along the deflection direction surround the deflected ion beam traveled along the ion beam orbit.
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