发明授权
- 专利标题: Semiconductor memory
- 专利标题(中): 半导体存储器
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申请号: US934556申请日: 1986-11-24
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公开(公告)号: US4901128A公开(公告)日: 1990-02-13
- 发明人: Hideo Sunami , Tokuo Kure , Masanobu Miyao , Yoshifumi Kawamoto , Katsuhiro Shimohigashi , Yoshio Sakai , Osamu Minato , Toshiaki Masuhara , Mitsumasa Koyanagi , Shinji Shimizu
- 申请人: Hideo Sunami , Tokuo Kure , Masanobu Miyao , Yoshifumi Kawamoto , Katsuhiro Shimohigashi , Yoshio Sakai , Osamu Minato , Toshiaki Masuhara , Mitsumasa Koyanagi , Shinji Shimizu
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX57-192478 19821104; JPX58-210825 19831111; JPX58-216143 19831118; JPX58-243997 19831226; JPX59-204001 19841001
- 主分类号: G11C11/404
- IPC分类号: G11C11/404 ; H01L27/108 ; H01L29/94
摘要:
A semiconductor memory comprises a capacitor with a data storage portion, and an insulated-gate field-effect transistor. The capacitor is formed by a plate which is made up of the side walls and base of a groove formed in a semiconductor substrate, and by a capacitor electrode formed on the side walls and the base, over an insulation film, and which is connected electrically to the source or drain of the insulated-gate field-effect transistor. Various embodiments are provided for reducing size and preventing leakage between other memory cells, including forming stacked capacitors, forming the transistor over the capacitor, using a silicon-over-insulator arrangement for the transistor, forming a common capacitor plate and providing high impurity layers within the substrate.
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