发明授权
- 专利标题： Aminoazole derivatives and their production and use
- 专利标题（中）： 氨基唑衍生物及其生产和使用
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申请号： US55079申请日： 1987-05-28
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公开(公告)号： US4914112A公开(公告)日： 1990-04-03
- 发明人: Yukinori Ozato , Nobuhiko Tamura , Hiroaki Masumori , Michihiro Yamamoto , Atsuyuki Kojima , Fumio Nishikaku , Yoshihiko Kimura
- 申请人： Yukinori Ozato , Nobuhiko Tamura , Hiroaki Masumori , Michihiro Yamamoto , Atsuyuki Kojima , Fumio Nishikaku , Yoshihiko Kimura
- 申请人地址： JPX Osaka
- 专利权人： Sumitomo Pharmaceuticals Company, Limited
- 当前专利权人： Sumitomo Pharmaceuticals Company, Limited
- 当前专利权人地址： JPX Osaka
- 优先权： JPX61-128910 19860603; JPX61-164508 19860711
- 主分类号： A61K31/41
- IPC分类号： A61K31/41 ; A61K31/42 ; A61K31/421 ; A61K31/4245 ; A61K31/425 ; A61K31/426 ; A61K31/433 ; A61P29/00 ; A61P37/00 ; A61P37/08 ; C07D261/14 ; C07D263/48 ; C07D271/06 ; C07D271/07 ; C07D277/20 ; C07D277/38 ; C07D277/40 ; C07D277/42 ; C07D277/44 ; C07D277/46 ; C07D277/48 ; C07D285/04 ; C07D317/30 ; C07D413/06 ; C07D413/10 ; C07D417/10
摘要：
A compound of the formula: ##STR1## wherein A is the group of the formula:Ar.sup.1 --D--Ar.sup.2 --wherein Ar.sup.1 is a phenyl or thienyl group which may be optionally substituted with at least one of the same or different halogen atom; Ar.sup.2 is a phenylene or thienylene group which may be optionally substituted with at least one of the same or different halogen atom; D is a divalent radical selected from the group consisting of >C.dbd.N--OR.sup.4 [wherein R.sup.4 is a hydrogen atom or lower alkyl group], >C.dbd.O, ##STR2## >CHOH, >NH radical, or single bond, ##STR3## wherein R.sup.5 is a lower alkoxy or a phenyl group which may be optionally substituted with at least one of the same or different halogen atom; E is a methine group or a nitrogen atom; F is a vinylene group or an oxygen atom, ##STR4## wherein R.sup.6 is a lower alkoxy group; R.sup.7 is a lower alkyl group; R.sup.8 is a benzoyl group which may be optionally substituted with at least one of the same or different halogen atom, B is a divalent azole group; R.sup.1 is a hydrogen atom or a lower alkyl group; R.sup.2 is a hydrogen atom, lower alkyl, aryl-lower alkyl, or the group of the formula:R.sup.9 --G--wherein R.sup.9 is a hydrogen atom, lower alkyl, halo-lower alkyl, amino-lower alkyl, aryl or aryl-lower alkyl group or the group of the formula: ##STR5## wherein R.sup.10 is a hydrogen atom or lower alkoxy group; R.sup.11 is a hydrogen atom, lower alkyl, lower alkenyl, lower cycloalkyl, aryl-lower alkyl, aryl or aroyl group; or the group of the formula: --NR.sup.10 R.sup.11 is a 5-, 6- or 7-membered saturated heterocyclic ring; or the group of the formula:R.sup.12 --O--wherein R.sup.12 is a lower alkyl or polyhalo-lower alkyl group; G is a divalent group selected from the group consisting of >C.dbd.O, >C.dbd.S, >(C.dbd.O).sub.2 or >SO.sub.2 radical; or the group of the formula: --NR.sup.1 R.sup.2 is a 5-, 6- or 7-membered saturated heterocyclic ring: R.sup.3 is a hydrogen atom or lower alkyl group, or its acid addition salts, which is useful for immunomodulator.
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