发明授权
- 专利标题: Reductive dehalogenation of organic halogen compounds
- 专利标题(中): 有机卤素化合物的还原性脱卤
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申请号: US189362申请日: 1988-05-02
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公开(公告)号: US4943671A公开(公告)日: 1990-07-24
- 发明人: Toni Dockner , Manfred Sauerwald , Herbert Krug , Matthias Irgang
- 申请人: Toni Dockner , Manfred Sauerwald , Herbert Krug , Matthias Irgang
- 申请人地址: DEX Ludwigshafen
- 专利权人: BASF Aktiengesellschaft
- 当前专利权人: BASF Aktiengesellschaft
- 当前专利权人地址: DEX Ludwigshafen
- 优先权: DEX3715751 19870512
- 主分类号: C07C1/30
- IPC分类号: C07C1/30 ; B01J23/745 ; B01J27/043 ; C07B61/00 ; C07C1/00 ; C07C1/26 ; C07C11/06 ; C07C15/04 ; C07C17/23 ; C07C17/354 ; C07C67/00
摘要:
Organic halogen compounds in which one or more halogen atoms are covalently bonded to the carbon are subjected to reductive dehalogenation by reaction with a hydrocarbon in the presence of carbon at elevated temperatures with formation of a hydrogen halide, by a process in which the dehalogenation is carried out in the presence of iron powder or an iron compound as a cocatalyst, at from 100.degree. to 450.degree. C.
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