发明授权
- 专利标题： Method of removing a layer of organic matter
- 专利标题（中）： 去除一层有机物的方法
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申请号： US488556申请日： 1990-03-05
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公开(公告)号： US4980022A公开(公告)日： 1990-12-25
- 发明人: Shuzo Fujimura , Kenichi Hikazutani
- 申请人： Shuzo Fujimura , Kenichi Hikazutani
- 申请人地址： Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： Kawasaki
- 优先权： JPX1-56053 19890310
- 主分类号： H01L21/302
- IPC分类号： H01L21/302 ; G03F7/42 ; H01L21/027 ; H01L21/3065 ; H01L21/311
摘要：
A method removes a first layer of an organic matter which is formed on a second layer, where the first layer is subjected to an ion implantation. The method includes the steps of generating a plasma by exciting a gas which includes H.sub.2 O using a high-frequency energy source, and removing the first layer within the plasma.
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