发明授权
US4980268A Negative photoresists of the polyimide type containing 1,2-disulfones
失效
含有1,2-二砜的聚酰亚胺类型的负型光致抗蚀剂
- 专利标题： Negative photoresists of the polyimide type containing 1,2-disulfones
- 专利标题（中）： 含有1,2-二砜的聚酰亚胺类型的负型光致抗蚀剂
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申请号： US321432申请日： 1989-03-09
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公开(公告)号： US4980268A公开(公告)日： 1990-12-25
- 发明人: Ekkehard Bartmann , Rudolf Klug , Reinhard Schulz , Hartmut Hartner
- 申请人： Ekkehard Bartmann , Rudolf Klug , Reinhard Schulz , Hartmut Hartner
- 申请人地址： NY Ardsley
- 专利权人： Ciba-Geigy Corporation
- 当前专利权人： Ciba-Geigy Corporation
- 当前专利权人地址： NY Ardsley
- 优先权： DEX3808927 19880317
- 主分类号： C08L79/08
- IPC分类号： C08L79/08 ; C08G73/10 ; C08K5/42 ; G03F7/031
摘要：
The invention relates to negative photoresists of the polyimide type essentially containing, in an organic solvent, in each case at least(a) one polyamide-acid or polyamide-acid derivative prepolymer which can be converted into a highly heat-resistant polyimide polymer,(b) a photoinitiator, and, if appropriate, further customary additives which contain, as the photoinitiator, a compound of the formula IR.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 I in which R.sup.1 and R.sup.2 are as defined.
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