发明授权
- 专利标题: Restricted contact planar photodiode
- 专利标题(中): 受限接触平面光电二极管
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申请号: US464505申请日: 1990-01-12
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公开(公告)号: US4990989A公开(公告)日: 1991-02-05
- 发明人: Mahmoud A. ElHamamsy , Stephen R. Forrest , John R. Zuber
- 申请人: Mahmoud A. ElHamamsy , Stephen R. Forrest , John R. Zuber
- 申请人地址: NJ Murray Hill
- 专利权人: AT&T Bell Laboratories
- 当前专利权人: AT&T Bell Laboratories
- 当前专利权人地址: NJ Murray Hill
- 主分类号: H01L31/0216
- IPC分类号: H01L31/0216 ; H01L31/0224 ; H01L31/105
摘要:
An InGaAs photodiode is described in which a double layer of silicon nitride on the front surface serves several functions; both layers passivate the surface; an opening in the lower layer provides a diffusion mask for forming the p-n junction; and a narrower opening in the upper silicon nitride layer provides a deposition mask for forming a restricted area contact. In order to reduce strain near the junction, and hence reduce leakage currents and enhance reliability, the contact geometry has a narrow pedestal portion which contacts the surface in a zone remote from the junction edges and has a wider cap portion which is formed on the pedestal portion to seal the surface from the introduction of contaminants. The photodiode may be back-illuminated or front-illuminated.
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