发明授权
- 专利标题: Organometallic solutions for forming oxide superconducting films
- 专利标题(中): 用于形成氧化物超导膜的有机金属溶液
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申请号: US379972申请日: 1989-07-14
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公开(公告)号: US5001110A公开(公告)日: 1991-03-19
- 发明人: Toshihisa Nonaka , Keisuke Kobayashi , Hiroyuki Igaki , Michiyasu Matsuki
- 申请人: Toshihisa Nonaka , Keisuke Kobayashi , Hiroyuki Igaki , Michiyasu Matsuki
- 申请人地址: JPX Tokyo
- 专利权人: Toray Industries, Inc.
- 当前专利权人: Toray Industries, Inc.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-131093 19870529; JPX62-186304 19870724; JPX63-14009 19880125
- 主分类号: C03C17/25
- IPC分类号: C03C17/25 ; C04B35/45 ; C04B41/50 ; C04B41/87 ; H01L39/24
摘要:
A solution for forming a superconductive thin film prepared by dissolving a mol of a compound selected from group A consisting of alkoxides and alkoxyalkoxides of a rare earth metal element; b mol of a compound selected from group B consisting of alkoxides and alkoxyalkoxides of Ba, Sr and Ca; and c mol of a compound selected from group C consisting of alkoxides and alkoxyalkoxides of Cu in e liter of a compound selected from group E, a solvent selected from alcohols together with d mol of a compound selected from group D for inhibiting hydrolysis action such as an amine, a ketone and a glycol, such that the following relationships:0.1.times.(a+b+c).ltoreq.d.ltoreq.3.times.(a+b+c)and0.01.ltoreq.[(a+b+c)/e].ltoreq.3can be satisfied.
公开/授权文献
- US5526271A Franking machine 公开/授权日:1996-06-11
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