发明授权
- 专利标题: Process for manufacturing transparent, conductive film
- 专利标题(中): 制造透明导电膜的工艺
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申请号: US585263申请日: 1990-09-19
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公开(公告)号: US5013416A公开(公告)日: 1991-05-07
- 发明人: Yoichi Murayama , Tetsuya Nomachi
- 申请人: Yoichi Murayama , Tetsuya Nomachi
- 申请人地址: JPX Osaka JPX Tokyo
- 专利权人: Tobi Col, Ltd.,Murayama; Yoichi
- 当前专利权人: Tobi Col, Ltd.,Murayama; Yoichi
- 当前专利权人地址: JPX Osaka JPX Tokyo
- 优先权: JPX61-54162 19860312
- 主分类号: C08J7/00
- IPC分类号: C08J7/00 ; C23C14/08 ; C23C14/32 ; C23C14/56 ; H01B13/00
摘要:
A conductive thin film is deposited on the surface of plastic film moving at high velocity by ion-plating using a pressure-gradient discharge. The moving velocity of the substrate film is as high as 8 to 30m/min. A conductive, thin film composed of indium oxide, tin oxide, TTD and similar substances is deposited on the plastic film, at a pressure of 1.times.10.sup.-5 to 1.times.10.sup.-1 Torr and a discharge voltage of 50 to 100 V.
公开/授权文献
- US5733608A Method and apparatus for applying thin fluid coating stripes 公开/授权日:1998-03-31
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