发明授权
- 专利标题: Photosensitive material and image forming method
- 专利标题(中): 感光材料和成像方法
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申请号: US322123申请日: 1989-03-13
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公开(公告)号: US5041369A公开(公告)日: 1991-08-20
- 发明人: Tetsuro Fukui , Kazuo Yoshinaga , Hideaki Mitsutake , Katsuya Oikawa , Shinsuke Takeuchi , Takeshi Miyazaki , Yoshio Takasu , Akihiro Mouri , Masato Katayama , Kazuo Isaka
- 申请人: Tetsuro Fukui , Kazuo Yoshinaga , Hideaki Mitsutake , Katsuya Oikawa , Shinsuke Takeuchi , Takeshi Miyazaki , Yoshio Takasu , Akihiro Mouri , Masato Katayama , Kazuo Isaka
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX63-056137 19880311; JPX63-186745 19880728; JPX63-287736 19881116; JPX64-524 19890106; JPX1-3398 19890110
- 主分类号: G03C1/498
- IPC分类号: G03C1/498 ; G03F7/028
摘要:
A photosensitive material comprises a photosensitive and heat-developable element, and further a light-to-heat conversion element or a nonlinear optical function element. The photosensitive and heat-developable element comprises at least a photosensitive silver halide, an organic silver salt and a reducing agent. The light-to-heat conversion element comprises at least one of an inorganic metal and an organic coloring matter. The nonlinear optical function element comprises a comprises a compound selected from the group consisting of an inorganic crystal, an organic crystal, a polymer, a polymeric liquid crystal, a polymeric composition and a polymeric liquid crystal composition. An image forming method employing the photosensitive material comprises the steps of imagewise exposing the material by use of a laser beam, heating the material and forming a polymer image on the material.
公开/授权文献
- US4415373A Laser process for gettering defects in semiconductor devices 公开/授权日:1983-11-15
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