发明授权
US5045436A Polymer compositions containing a dissolved dibenzalacetone palladium
complex
失效
含有溶解的二苄基丙酮钯络合物的聚合物组合物
- 专利标题: Polymer compositions containing a dissolved dibenzalacetone palladium complex
- 专利标题(中): 含有溶解的二苄基丙酮钯络合物的聚合物组合物
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申请号: US319884申请日: 1989-03-03
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公开(公告)号: US5045436A公开(公告)日: 1991-09-03
- 发明人: Bernd Tieke , Sheik A. Zahir
- 申请人: Bernd Tieke , Sheik A. Zahir
- 申请人地址: NY Ardsley
- 专利权人: Ciba-Geigy Corporation
- 当前专利权人: Ciba-Geigy Corporation
- 当前专利权人地址: NY Ardsley
- 优先权: CHX348/86 19860130
- 主分类号: H01B1/20
- IPC分类号: H01B1/20 ; C08K5/00 ; C08L1/00 ; C08L27/00 ; C08L101/00 ; C09D5/00 ; C09D5/24 ; C23C18/30 ; H01B13/00
摘要:
The invention relates to compositions containinga) at least one organic polymer andb) a dibenzalacetone palladium complex of formula I ##STR1## which is homogeneously dissolved in said polymer but is not copolymerisable therewith, in which formula IR.sup.1 is hydrogen, C.sub.1 -C.sub.18 alkyl, C.sub.1 -C.sub.18 alkoxy or unsubstituted or substituted phenyl,R.sup.2 has one of the meanings of R.sup.1 or is also an amino, nitro or cyano group, an --O--C.sub.m H.sub.2mn OR.sup.4 or --O--CH.sub.2 --CH.OR.sup.4 --CH.sub.2.OR.sup.5 radical or a halogen atom or a glycidyl ether radical,R.sup.3 is hydrogen or C.sub.1 -C.sub.4 alkyl or the two groups R.sup.3 together form a C.sub.2 -C.sub.4 polymethylene chain,R.sup.4 and R.sup.5 have one of the meanings of R.sup.1,q is a value from 1 to 3.5,m is a value from 2 to 6 andn is a value from 0 to 20, with the proviso that the composition does not contain a polymer with an olefinic double bond.Said compositions can be used for metal deposition without current or for producing conductive patterns.
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