A method and apparatus for producing fine line patterns on insulating surfaces utilizing a conductive spring-like cantilever having a pointed tip which is in proximity to the surface to be affected. Electrons emitted from the tip travel toward the insulator surface and cause changes therein or affect molecules located in the proximity of the insulator surface. Tunneling current is not required, and a highly conducting return current path for electrons through the insulator is not necessary. The incident electrons can be used to provide patterned, narrow-width features either by deposition of a material onto the insulator surface, or by producing etching in localized regions of the insulator surface, or by changing the insulator surface so that it can be etched.