发明授权
- 专利标题: Method and apparatus for checking pattern
- 专利标题(中): 检查图案的方法和装置
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申请号: US426574申请日: 1989-10-24
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公开(公告)号: US5048094A公开(公告)日: 1991-09-10
- 发明人: Yoshiyuki Aoyama , Takahiro Nakano , Osamu Kanasashi
- 申请人: Yoshiyuki Aoyama , Takahiro Nakano , Osamu Kanasashi
- 申请人地址: JPX Tokyo
- 专利权人: Nippon Seiko Kabushiki Kaisha
- 当前专利权人: Nippon Seiko Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX63-301866 19881129
- 主分类号: G06T1/00
- IPC分类号: G06T1/00 ; G01R31/308 ; G03F7/20 ; G06T7/00
摘要:
A pattern formed on an object under check such as a mask, printed substrate, etc., is scanned by a CCD camera, and check pattern data for one scanning line obtained from the CCD camera is divided into a plurality of pixel groups and stored in shift register groups. The check pattern data is compared with a master pattern data representing the external shape of a master pattern to calculate an inclination of the check pattern (pattern to be checked) with respect to the master pattern. The order of reading addresses of the shift register groups is changed in accordance with the inclination so that the check pattern data matches the master pattern data. Thereafter, the check pattern data is compared with the master pattern data to detect a defect in the check pattern to thereby avoid erroneous judgment due to an angular deviation between the check pattern and the master pattern.
公开/授权文献
- US5611156A Reflective shoe 公开/授权日:1997-03-18
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