发明授权
- 专利标题: Electron beam excitation ion source
- 专利标题(中): 电子束激发离子源
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申请号: US480765申请日: 1990-02-16
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公开(公告)号: US5089747A公开(公告)日: 1992-02-18
- 发明人: Akira Koshiishi , Kohei Kawamura , Naoki Takayama
- 申请人: Akira Koshiishi , Kohei Kawamura , Naoki Takayama
- 申请人地址: JPX Tokyo
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX1-39016 19890216; JPX1-39017 19890216
- 主分类号: H01J27/20
- IPC分类号: H01J27/20 ; H01J37/08
摘要:
An electron beam excitation ion source includes a housing having an ion generation chamber therein, a port for supplying a discharge gas to the ion generation chamber, a porous electrode for supplying accelerated electrons to the ion generation chamber from an electron generation chamber, causing the accelerated electrons to collide against the discharge gas to generate a plasma containing ions in the ion generation chamber. The housing have an ion extraction slit port through which the ions are extracted from the ion generation chamber outside the housing. An electrode is formed around the ion extraction port, for causing a local discharge around the ion extraction port so as to guide the ions in the plasma to the ion extraction port.
公开/授权文献
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