发明授权
- 专利标题: Field effect transistor and method for making same
- 专利标题(中): 场效应晶体管及其制造方法
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申请号: US289390申请日: 1988-12-22
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公开(公告)号: US5101245A公开(公告)日: 1992-03-31
- 发明人: Teruyuki Shimura
- 申请人: Teruyuki Shimura
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX62-335887 19871228
- 主分类号: H01L21/265
- IPC分类号: H01L21/265 ; H01L21/337 ; H01L21/338 ; H01L21/76 ; H01L27/095 ; H01L29/778 ; H01L29/80 ; H01L29/808 ; H01L29/812
摘要:
A field effect transistor including a semi-insulating semiconductor substrate, a first conductivity type semiconductor layer disposed on the substrate and forming a heterojunction with the substrate, second conductivity type spaced apart source and drain regions extending through the layer into the substrate, a metallic gate disposed on the layer between the source and drain regions, and a second conductivity type channel disposed in the substrate extending between the source and drain regions and forming a pn heterojunction with the layer for reducing leakage current from the channel to the gate. The second conductivity type channel is produced by ion implantation, and the implantation conditions are controlled as a mechanism for controllably establishing a threshold voltage for the field effect transistor.
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