A method for storing a semiconductor substrate preserves the semiconductor substrate at a temperature not more than 10.degree. C. in a sealed manner. After the surface of the semiconductor substrate has been cleaned by etching or the like, the semiconductor substrate is put in a bag of a synthetic resin sheet. An inert gas is introduced into the bag or the bag is brought into a vacuum state, the bag is sealed, and then maintained at the above temperature, whereby the cleaned surface is not recontaminated for a prolonged period of time.