公开(公告)号：US09511310B2

公开(公告)日：2016-12-06

申请号：US13580175

申请日：2011-02-16

Applicant: Munetsugu Ueyama ,  Ryusuke Nakai ,  Hideki Kashihara ,  Manabu Okui

Inventor： Munetsugu Ueyama ,  Ryusuke Nakai ,  Hideki Kashihara ,  Manabu Okui

IPC: B01D33/70 ,  B01D37/00 ,  B01D29/21 ,  B01D29/64 ,  B01D29/74 ,  B01D29/92 ,  C02F1/32 ,  B01D33/073 ,  B01D33/39 ,  B01D33/46 ,  B01D35/30 ,  B63J4/00 ,  C02F1/00 ,  C02F103/00

CPC classification number: B01D29/21 ,  B01D29/6446 ,  B01D29/74 ,  B01D29/92 ,  B01D33/073 ,  B01D33/39 ,  B01D33/463 ,  B01D35/303 ,  B01D2201/583 ,  B63J4/002 ,  C02F1/001 ,  C02F1/325 ,  C02F2103/008 ,  C02F2209/11 ,  C02F2303/04 ,  Y02T70/36

Abstract: A filter disposed as a cylinder around an axis line, and provided to be rotatable around the axis line, a treated water nozzle for emitting treated water toward an outer circumferential surface of the filter, a case provided to surround the filter, and including an outer cylindrical portion having a nozzle opening of the treated water nozzle therein, a filtered water flow path for guiding filtered water that has been transmitted through the filter to outside of the case from within the cylinder of the filter, and a discharge flow path for discharging discharged water that was not filtered through the filter to the outside of the case are provided.

Abstract translation: 一个过滤器，其围绕轴线设置为圆柱体，并且设置成可围绕轴线旋转;处理水喷嘴，用于朝向过滤器的外周表面喷射经处理的水，设置成围绕过滤器的壳体，并且包括外部 具有处理水喷嘴的喷嘴开口的圆柱形部分，用于将已经从过滤器透过过滤器的过滤水引导到过滤器的气缸内部的过滤水流路和用于排出的排出流体 还提供了没有通过过滤器过滤到壳体外部的水。

公开(公告)号：US4863554A

公开(公告)日：1989-09-05

申请号：US17072

申请日：1987-02-20

Applicant: Akihisa Kawasaki ,  Toshihiro Kotani ,  Ryusuke Nakai ,  Shintaro Miyazawa ,  Keigo Hoshikawa

Inventor： Akihisa Kawasaki ,  Toshihiro Kotani ,  Ryusuke Nakai ,  Shintaro Miyazawa ,  Keigo Hoshikawa

IPC: C30B15/14 ,  C30B27/02 ,  H01L21/208

CPC classification number: C30B15/14

Abstract: An apparatus for pulling a single crystal by CZ method or LEC method is improved. To this end, the heater for heating the inside of the furnace is divided at least in the vicinity of the solid-liquid interface into at least two heaters. Using this apparatus, a single crystal with a decreased dislocation density can be obtained.

Abstract translation: 通过CZ法或LEC法提取单晶的装置得到改善。 为此，用于加热炉内部的加热器至少在固 - 液界面附近分成至少两个加热器。 使用该装置，可以获得具有降低的位错密度的单晶。

公开(公告)号：US20120118824A1

公开(公告)日：2012-05-17

申请号：US13297706

申请日：2011-11-16

Applicant: Hideki KASHIHARA ,  Ryusuke Nakai ,  Shuji Hahakura ,  Satoshi Yahagi

Inventor： Hideki KASHIHARA ,  Ryusuke Nakai ,  Shuji Hahakura ,  Satoshi Yahagi

IPC: C02F1/44 ,  B01D71/26 ,  B01D71/34 ,  B01D69/02 ,  B01D71/36

CPC classification number: C02F1/441 ,  B01D61/00 ,  B01D61/025 ,  B01D61/145 ,  B01D61/147 ,  B01D61/58 ,  B01D65/02 ,  B01D69/02 ,  B01D71/34 ,  B01D71/36 ,  B01D2321/04 ,  B01D2321/2058 ,  B01D2321/2075 ,  B01D2325/02 ,  B01D2325/38 ,  C02F1/444 ,  C02F2103/06 ,  C02F2103/08 ,  C02F2301/08 ,  C02F2303/24 ,  Y02A20/131

Abstract: There is provided a water treatment apparatus, including: first membrane filtration means in which a filtration membrane having an average pore diameter of 1 μm or more is used; second membrane filtration means for treating water filtered by the first membrane filtration means, by using a microfiltration membrane or ultrafiltration membrane; and reverse osmosis membrane filtration means for treating water filtered by the second membrane filtration means. In particular, there is provided a water treatment apparatus, wherein a hydrophobic polymer membrane that is not subjected to hydrophilicizing processing is used as the filtration membrane having an average pore diameter of 1 μm or more. There is also provided a water treatment method that can be implemented by these water treatment apparatuses.

Abstract translation: 提供了一种水处理装置，包括：第一膜过滤装置，其中使用平均孔径为1μm以上的过滤膜; 第二膜过滤装置，用于处理由第一膜过滤装置过滤的水，通过使用微滤膜或超滤膜; 以及用于处理由第二膜过滤装置过滤的水的反渗透膜过滤装置。 特别地，提供了一种水处理装置，其中使用不进行亲水化处理的疏水性聚合物膜作为平均孔径为1μm以上的过滤膜。 还提供了可以通过这些水处理装置实施的水处理方法。

公开(公告)号：US06180269B2

公开(公告)日：2001-01-30

申请号：US09334215

申请日：1999-06-16

Applicant: Yoshiaki Hagi ,  Ryusuke Nakai

Inventor： Yoshiaki Hagi ,  Ryusuke Nakai

IPC: B32B900

CPC classification number: H01L21/0262 ,  C30B11/00 ,  C30B29/42 ,  H01L21/02395 ,  H01L21/02463 ,  H01L21/02546 ,  Y10T428/265

Abstract: A GaAs single crystal substrate and an epitaxial wafer using the same suppress the generation of slips during growth of the epitaxial layer, and improve the breakdown withstanding characteristic of devices fabricated on such substrates. The GaAs single crystal substrate has a mean dislocation density in plane of at most 2×104 cm−2, a carbon concentration of 2.5 to 20.0×1015 cm−3, a boron concentration of 2.0 to 20.0×1016 cm−3, an impurity concentration other than carbon and boron of at most 1×1017 cm−3, an EL2 concentration of 5.0 to 10.0×1015 cm−3, resistivity of 1.0 to 5.0×108 &OHgr;·cm and a mean residual strain measured by photoelastic analysis of at most 1.0×10−5.

Abstract translation: GaAs单晶衬底和使用其的外延晶片抑制外延层生长期间的滑移的产生，并且改善在这种衬底上制造的器件的击穿耐受特性。 GaAs单晶基板的平面位错密度为2×104cm-2以下，碳浓度为2.5〜20.0×10 15 cm -3，硼浓度为2.0〜20.0×10 16 cm -3，碳以外的杂质浓度 和至多1×10 17 cm -3的硼，EL 2浓度为5.0至10.0×10 15 cm -3，电阻率为1.0至5.0×10 8ΩEGA.cm，通过光弹性分析测量的平均残余应变为至多1.0×10 -5。

公开(公告)号：US20120312757A1

公开(公告)日：2012-12-13

申请号：US13580175

申请日：2011-02-16

Applicant: Munetsugu Ueyama ,  Ryusuke Nakai ,  Hideki Kashihara ,  Manabu Okui

Inventor： Munetsugu Ueyama ,  Ryusuke Nakai ,  Hideki Kashihara ,  Manabu Okui

IPC: B01D33/70 ,  B01D37/00 ,  B01D33/35

CPC classification number: B01D29/21 ,  B01D29/6446 ,  B01D29/74 ,  B01D29/92 ,  B01D33/073 ,  B01D33/39 ,  B01D33/463 ,  B01D35/303 ,  B01D2201/583 ,  B63J4/002 ,  C02F1/001 ,  C02F1/325 ,  C02F2103/008 ,  C02F2209/11 ,  C02F2303/04 ,  Y02T70/36

Abstract: A filter disposed as a cylinder around an axis line, and provided to be rotatable around the axis line, a treated water nozzle for emitting treated water toward an outer circumferential surface of the filter, a case provided to surround the filter, and including an outer cylindrical portion having a nozzle opening of the treated water nozzle therein, a filtered water flow path for guiding filtered water that has been transmitted through the filter to outside of the case from within the cylinder of the filter, and a discharge flow path for discharging discharged water that was not filtered through the filter to the outside of the case are provided.

Abstract translation: 一个过滤器，其围绕轴线设置为圆柱体，并且设置成可围绕轴线旋转;处理水喷嘴，用于朝向过滤器的外周表面喷射经处理的水，设置成围绕过滤器的壳体，并且包括外部 具有处理水喷嘴的喷嘴开口的圆柱形部分，用于将已经从过滤器透过过滤器的过滤水引导到过滤器的气缸内部的过滤水流路和用于排出的排出流体 还提供了没有通过过滤器过滤到壳体外部的水。

公开(公告)号：US4634490A

公开(公告)日：1987-01-06

申请号：US679895

申请日：1984-12-10

Applicant: Masami Tatsumi ,  Shin-ichi Sawada ,  Ryusuke Nakai

Inventor： Masami Tatsumi ,  Shin-ichi Sawada ,  Ryusuke Nakai

IPC: C30B15/26 ,  G01N23/207

CPC classification number: C30B15/26 ,  G01N23/207

Abstract: Single crystal during growth is irradiated by an slitted X-ray beam and the diffracted X-ray beam from the crystal is monitored by an image amplifier with a two dimensional manner so that the diffracted X-ray can be monitored by the image amplifier even if there occurs change of the diameter of the crystal. A half portion of the single crystal during growth is irradiated by a slitted X-ray beam and the other half portion of the crystal is irradiated by the X-ray beam over the entire height of the crystal so that the Laue spots of the crystal growth is displayed on one half portion of the display of the image amplifier and a shape of the crystal being pulled up is monitored in another half portion of the display of the image amplifier.

Abstract translation: 生长期间的单晶由切割的X射线束照射，并且来自晶体的衍射X射线束以二维方式由图像放大器监测，使得衍射的X射线可被图像放大器监测，即使 发生晶体直径的变化。 生长期间单晶的一半部分被切割的X射线束照射，并且晶体的另一半部分在晶体的整个高度上被X射线束照射，使得晶体生长的Laue斑点 被显示在图像放大器的显示器的一半部分上，并且在图像放大器的显示器的另一半部分中监视被上拉的晶体的形状。

公开(公告)号：US4556784A

公开(公告)日：1985-12-03

申请号：US539905

申请日：1983-10-07

Applicant: Ryusuke Nakai

Inventor： Ryusuke Nakai

IPC: C30B15/14 ,  C30B15/20 ,  C30B27/02 ,  F27B14/00

CPC classification number: C30B15/14 ,  C30B15/20

Abstract: In the pulling of a single crystal from a melt by the Czochralski method the temperature of the melt and the crystal is controlled by a plurality of heaters surrounding the crucible in vertically disposed relation relative to each other. The lowermost heater is controlled by an automatic temperature controller in response to the temperature of the bottom of the crucible and the remaining heaters are controlled by the selectring a specific ratio for the power supply of each of the remaining heaters with respect to the power supply of the lowermost heater.

Abstract translation: 在通过切克劳斯基法从熔体中拉出单晶时，熔体和晶体的温度由围绕坩埚的多个加热器以彼此垂直设置的关系来控制。 最低的加热器由自动温度控制器控制，响应于坩埚底部的温度，剩余的加热器通过选择来控制每个剩余加热器的电源相对于电源的电源的特定比例 最低的加热器。

公开(公告)号：US20120074059A1

公开(公告)日：2012-03-29

申请号：US13242528

申请日：2011-09-23

Applicant: Shuji HAHAKURA ,  Hideki Kashihara ,  Satoshi Yahagi ,  Ryusuke Nakai

Inventor： Shuji HAHAKURA ,  Hideki Kashihara ,  Satoshi Yahagi ,  Ryusuke Nakai

IPC: B01D65/06 ,  B01D71/32 ,  B01D71/26

CPC classification number: C02F1/44 ,  B01D65/02 ,  B01D2313/12 ,  B01D2321/04 ,  B01D2321/168 ,  B01D2321/185 ,  C02F1/441 ,  C02F1/444 ,  C02F2103/008 ,  C02F2103/08 ,  C02F2303/16

Abstract: There is provided a cleaning method for a hydrophobic filtration membrane used for membrane filtration of water to be treated such as seawater, discharged water and ballast water including a jelly-like suspended substance and clogged with the suspended substance in the water to be treated, the filtration membrane being brought into contact with limonene-containing water, or backwashing of the filtration membrane with a cleaning liquid being done, and then, a flow having air taken therein being applied onto a surface of the filtration membrane or a water stream from an eductor nozzle being sprayed onto the filtration membrane. There is also provided a membrane filtration apparatus capable of efficiently performing the above-mentioned cleaning method.

Abstract translation: 本发明提供一种用于对被处理水进行膜过滤的疏水性过滤膜的清洗方法，例如海水，排出水和包含果冻状悬浮物质的压载水，并将被悬浮物质堵塞在被处理水中， 过滤膜与含柠檬烯的水接触，或者用完成的清洗液对过滤膜进行反冲洗，然后将其中吸入的空气的流量施加到过滤膜的表面或来自喷射器的水流 喷嘴喷射到过滤膜上。 还提供了能够有效地进行上述清洗方法的膜过滤装置。

公开(公告)号：US4636280A

公开(公告)日：1987-01-13

申请号：US643034

申请日：1984-08-21

Applicant: Ryusuke Nakai ,  Toshihiko Takebe ,  Hajime Yamazaki

Inventor： Ryusuke Nakai ,  Toshihiko Takebe ,  Hajime Yamazaki

IPC: H01L21/265 ,  H01L21/322 ,  C30B1/02

CPC classification number: H01L21/265 ,  H01L21/26546 ,  H01L21/3225

Abstract: An IC wafer with a uniform distribution of impurities is obtained by a pretreatment comprising annealing a semiconductor substrate at a high temperature for a long period of time and then cooling rapidly before IC processing.

Abstract translation: 具有均匀杂质分布的IC晶片通过预处理获得，包括在高温下长时间退火半导体衬底，然后在IC处理之前快速冷却。

公开(公告)号：US20130319953A1

公开(公告)日：2013-12-05

申请号：US14000456

申请日：2012-07-23

Applicant: Isao Ozawa ,  Munetsugu Ueyama ,  Ryusuke Nakai

Inventor： Isao Ozawa ,  Munetsugu Ueyama ,  Ryusuke Nakai

IPC: C02F1/00

CPC classification number: C02F1/00 ,  B01D29/21 ,  B01D29/54 ,  B01D29/6446 ,  B01D2201/583 ,  B63J4/002 ,  C02F1/004 ,  C02F2103/008

Abstract: A ballast water treatment apparatus includes a filter that is cylindrically formed so as to surround an axis, a case that includes an outer cylindrical portion that is disposed so as to surround the filter, a rotation mechanism that rotates the filter around the axis, an untreated water nozzle that ejects untreated water to a filter-surrounding region that is defined by an outer peripheral surface of the filter and the outer cylindrical portion, a cleaning water nozzle that ejects cleaning water toward the outer peripheral surface of the filter, a filtered water channel through which filtered water that has passed through the filter flows from a region inside the filter to outside of the case, and a discharge channel through which discharged water that has not passed through the filter is discharged from the filter-surrounding region to outside of the case.

Abstract translation: 一种压载水处理装置，包括以围绕轴线为圆筒状的过滤器，包括设置为围绕过滤器的外筒部的壳体，使过滤器绕轴线旋转的旋转机构，未处理 水喷嘴，其将未处理的水喷射到由过滤器的外周面和外筒部限定的过滤器周围区域;清洗水喷嘴，其向清洗器的外周面排出清洗水;过滤水通道 已通过过滤器的过滤水通过该过滤器从过滤器内部的区域流到壳体外部，并且未通过过滤器的排出水通过该排出通道从过滤器周围区域排出到外部 案件。