发明授权
- 专利标题： Method of evaluating characteristics of superconductors and process and apparatus for forming superconductor film by using the method
- 专利标题（中）： 超导体的特性评价方法及使用该方法形成超导薄膜的方法和装置
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申请号： US683421申请日： 1991-04-10
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公开(公告)号： US5107119A公开(公告)日： 1992-04-21
- 发明人: Takafumi Kimura , Hiroshi Nakao , Hideki Yamawaki , Masaru Ihara , Keigo Nagasaka
- 申请人： Takafumi Kimura , Hiroshi Nakao , Hideki Yamawaki , Masaru Ihara , Keigo Nagasaka
- 申请人地址： JPX Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX2-93925 19900411
- 主分类号： C01B13/14
- IPC分类号： C01B13/14 ; C01G1/00 ; C23C14/54 ; C23C16/52 ; G01N21/84 ; H01B12/06 ; H01B13/00 ; H01L39/00 ; H01L39/24
摘要：
A method of evaluating the characteristics of superconductors, comprising: irradiating light to a superconductor held at a predetermined temperature; detecting light transmitted through the superconductor and composing a spectrum of the transmitted light; and using the obtained spectrum, calculating a ratio of the number of electrons contributing to a normal conduction to the number of electrons contributing to a superconduction in the superconductor, the ratio being effective at said predetermined temperature. A process and an apparatus for forming superconductor films by using the method are also disclosed.
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