发明授权
- 专利标题： Photoresist compositions
- 专利标题（中）： 光电组合物
-
申请号： US202765申请日： 1988-06-03
-
公开(公告)号： US5124233A公开(公告)日： 1992-06-23
- 发明人: Kurt Meier , Ewald Losert
- 申请人： Kurt Meier , Ewald Losert
- 申请人地址： NY Ardsley
- 专利权人： Ciba-Geigy Corporation
- 当前专利权人： Ciba-Geigy Corporation
- 当前专利权人地址： NY Ardsley
- 优先权： CHX2214/87 19870612
- 主分类号： C08G59/50
- IPC分类号： C08G59/50 ; C08G59/40 ; C08G59/70 ; G03C1/72 ; G03F7/004 ; G03F7/038 ; G03F7/039 ; H05K3/06
摘要：
Positive-working photoresist compositions containing(a) an epoxide resin which can be hardened by heat,(b) a latent urea or imidazole hardener for the component (a) and(c) an iron-arene complex of the formula (I)[R.sup.1 (Fe.sup.II R.sup.2).sub.n ].sub.m.sup.+n [X].sub.n.sup.-m(I) in which n is 1 or 2, m is 1, 2, 3, 4 or 5, X is a non-nucleophilic anion, R.sup.1 is a .pi.-arene and R.sup.2 is an anion of a .pi.-arene, are described.These compositions are distinguished by good properties towards heat and chemicals and require short exposure times.
公开/授权文献
- US5428846A Batting trainer 公开/授权日：1995-07-04