发明授权
- 专利标题: Processes employing iodine-iodide etching solutions
- 专利标题(中): 使用碘碘化物蚀刻溶液的方法
-
申请号: US342587申请日: 1989-04-24
-
公开(公告)号: US5137700A公开(公告)日: 1992-08-11
- 发明人: Hilbert Sloan
- 申请人: Hilbert Sloan
- 申请人地址: MD Rockville
- 专利权人: Shapiro; Nelson H.
- 当前专利权人: Shapiro; Nelson H.
- 当前专利权人地址: MD Rockville
- 主分类号: C01B7/13
- IPC分类号: C01B7/13 ; C01B7/14 ; C01G7/00
摘要:
Aqueous iodine-iodide etching solutions are employed in the recovery of precious metals. Elemental iodine is precipitated from spent etching solutions and used to supply both the iodine and iodide of new etching solutions. Prior to extraction of the elemental iodine, used solutions, if not substantially contaminated, may be oxidized and recycled for further precious metal recovery. Aqueous etching solutions of hydriodic acid and iodine, or of ammonium iodide and iodine may be employed. Etching in such solutions, as well as in solutions of iodine and an alkali metal iodide, such as potassium iodide, may be accelerated by the use of small amounts of hydrogen peroxide (or equivalents) during etching.
公开/授权文献
- US5541784A Bootstrap method for writing servo tracks on a disk drive 公开/授权日:1996-07-30
信息查询