发明授权
US5137700A Processes employing iodine-iodide etching solutions 失效
使用碘碘化物蚀刻溶液的方法

  • 专利标题: Processes employing iodine-iodide etching solutions
  • 专利标题(中): 使用碘碘化物蚀刻溶液的方法
  • 申请号: US342587
    申请日: 1989-04-24
  • 公开(公告)号: US5137700A
    公开(公告)日: 1992-08-11
  • 发明人: Hilbert Sloan
  • 申请人: Hilbert Sloan
  • 申请人地址: MD Rockville
  • 专利权人: Shapiro; Nelson H.
  • 当前专利权人: Shapiro; Nelson H.
  • 当前专利权人地址: MD Rockville
  • 主分类号: C01B7/13
  • IPC分类号: C01B7/13 C01B7/14 C01G7/00
Processes employing iodine-iodide etching solutions
摘要:
Aqueous iodine-iodide etching solutions are employed in the recovery of precious metals. Elemental iodine is precipitated from spent etching solutions and used to supply both the iodine and iodide of new etching solutions. Prior to extraction of the elemental iodine, used solutions, if not substantially contaminated, may be oxidized and recycled for further precious metal recovery. Aqueous etching solutions of hydriodic acid and iodine, or of ammonium iodide and iodine may be employed. Etching in such solutions, as well as in solutions of iodine and an alkali metal iodide, such as potassium iodide, may be accelerated by the use of small amounts of hydrogen peroxide (or equivalents) during etching.
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