发明授权
- 专利标题： Exposure apparatus
- 专利标题（中）： 曝光装置
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申请号： US666649申请日： 1991-03-08
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公开(公告)号： US5172402A公开(公告)日： 1992-12-15
- 发明人: Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shunichi Uzawa
- 申请人： Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shunichi Uzawa
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX2-056674 19900309; JPX2-059904 19900313
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.
公开/授权文献
- US5697194A Modular seal assembly for a wall opening 公开/授权日：1997-12-16