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公开(公告)号:US5172402A
公开(公告)日:1992-12-15
申请号:US666649
申请日:1991-03-08
申请人: Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shunichi Uzawa
发明人: Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shunichi Uzawa
IPC分类号: G03F7/20
CPC分类号: G03F7/70008 , G03F7/702
摘要: An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.
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公开(公告)号:US5577552A
公开(公告)日:1996-11-26
申请号:US412101
申请日:1995-03-28
申请人: Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
发明人: Ryuichi Ebinuma , Takao Kariya , Nobutoshi Mizusawa , Koji Uda , Eiji Sakamoto , Shunichi Uzawa
CPC分类号: H05K7/20281 , G03F7/707 , G03F7/70875 , G05D23/1919
摘要: A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.
摘要翻译: 可适用于半导体微电路制造曝光装置的温度控制装置将半导体晶片暴露于掩模,以将掩模的图案印刷在晶片上。 该装置包括用于高精度地控制液体的温度的恒温液体介质供给系统,用于将供应的液体介质分配到多个流动通道中的分配系统,以将液体介质供应到多个控制对象,例如 ,掩模台,晶片台等。 该装置还包括多个温度控制装置,每个温度控制装置设置在对应的一个流动通道中,用于校正由相应流动通道中的压力损失能量产生的分配液体介质的温度变化。 因此,能够以简单的结构有效地控制多个控制对象的温度。
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公开(公告)号:US5157700A
公开(公告)日:1992-10-20
申请号:US401615
申请日:1989-08-31
申请人: Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
发明人: Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
IPC分类号: G03F7/20
CPC分类号: G03F7/70691 , G03F7/70058 , G03F7/70091 , G03F7/702
摘要: An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.
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公开(公告)号:US5377251A
公开(公告)日:1994-12-27
申请号:US203498
申请日:1994-02-28
申请人: Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shumichi Uzawa
发明人: Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shumichi Uzawa
CPC分类号: G03F7/70008 , G03F7/702
摘要: An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.
摘要翻译: 一种用于制造半导体器件的曝光方法,包括移动具有边缘的快门,使得边缘与预定曝光区域相关; 将曝光光束投影到所述光闸的边缘和所述曝光区域的至少一部分; 确定由曝光光束形成的快门的边缘相对于与可移动卡盘移动有关的预定坐标系的位置; 根据确定调整快门; 将基板放置在卡盘上; 移动卡盘使得基板与曝光区域相关; 以及通过所述快门控制所述基板与曝光光束的曝光。
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公开(公告)号:US5182615A
公开(公告)日:1993-01-26
申请号:US563420
申请日:1990-08-07
申请人: Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Nobutoshi Mizusawa , Shigeyuki Suda , Noriyuki Nose , Takao Kariya
发明人: Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Nobutoshi Mizusawa , Shigeyuki Suda , Noriyuki Nose , Takao Kariya
CPC分类号: G03F7/70691 , G03F9/7049
摘要: An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.
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公开(公告)号:US5112133A
公开(公告)日:1992-05-12
申请号:US769495
申请日:1991-10-01
申请人: Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Ryuichi Ebinuma , Takao Kariya
发明人: Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Ryuichi Ebinuma , Takao Kariya
IPC分类号: G03F9/00 , H01L21/027 , H01L21/30 , H01L21/68
CPC分类号: G03F9/70 , H01L21/681 , H01L21/682 , Y10T307/786
摘要: An alignment system usable in an exposure apparatus for printing a pattern of a mask on a wafer, for aligning the mask and the wafer, is disclosed. The system includes a plurality of position detecting devices; a plurality of driving stages corresponding to the position detecting devices, respectively, each driving stage being adapted to move a corresponding one of the position detecting devices two-dimensionally along a plane which is substantially opposed to the mask; a plurality of contacts corresponding to the position detecting devices, respectively, each contact being provided at an end portion of a corresponding one of the position detecting devices, along the plane and facing the pattern side; a detecting device for detecting mutual approach of the position detecting devices through at least one of the contacts; and a control device for controlling movement of at least one of the driving stages in accordance with the detection by the detecting device.
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公开(公告)号:US5641264A
公开(公告)日:1997-06-24
申请号:US996870
申请日:1992-12-21
申请人: Mitsutoshi Kuno , Hidehiko Fujioka , Nobutoshi Mizusawa , Yuji Chiba , Takao Kariya , Koji Uda , Shunichi Uzawa , Eigo Kawakami
发明人: Mitsutoshi Kuno , Hidehiko Fujioka , Nobutoshi Mizusawa , Yuji Chiba , Takao Kariya , Koji Uda , Shunichi Uzawa , Eigo Kawakami
IPC分类号: G03F7/20 , H01L21/687 , B65G65/00
CPC分类号: G03F7/70741 , H01L21/68707 , Y10S294/907
摘要: A method of controlling a conveying device having a gripping hand for gripping an article to be conveyed and a conveying mechanism for conveying the gripping hand, wherein a pressing force applied to the gripping hand through the article being conveyed is detected and the conveying operation of the conveying mechanism is stopped when the pressing force exceeds a predetermined force.
摘要翻译: 一种控制输送装置的方法,所述输送装置具有用于夹持要输送的物品的夹持手和用于输送夹持手的输送机构,其中检测到通过被输送物品施加到抓握手的按压力,并且输送操作 当按压力超过预定力时,输送机构停止。
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公开(公告)号:US5138643A
公开(公告)日:1992-08-11
申请号:US591252
申请日:1990-10-01
申请人: Eiji Sakamoto , Ryuichi Ebinuma , Mitsuaki Amemiya , Shunichi Uzawa , Koji Uda
发明人: Eiji Sakamoto , Ryuichi Ebinuma , Mitsuaki Amemiya , Shunichi Uzawa , Koji Uda
IPC分类号: G03F7/20
CPC分类号: G03F7/70875 , G03F7/70008 , G03F7/70691 , G03F7/70858 , G03F7/70866
摘要: An exposure apparatus includes a chamber for placing an article in a predetermined ambience; a holding device for holding the article in the chamber; a fluid supplying device for supplying a temperature adjusting fluid into the holding device through a flow passageway; a detecting device for detecting leakage of the fluid from the flow passageway; and a flow rate controlling device for controlling the flow rate of the fluid to be supplied to the holding device on the basis of the detection by the detecting device.
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公开(公告)号:US5226523A
公开(公告)日:1993-07-13
申请号:US963517
申请日:1992-10-20
申请人: Eigo Kawakami , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Mitsutoshi Kuno , Kazunori Iwamoto , Takao Kariya
发明人: Eigo Kawakami , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Mitsutoshi Kuno , Kazunori Iwamoto , Takao Kariya
CPC分类号: G03F7/70741 , G03F7/7075 , G05B19/231
摘要: A conveying apparatus includes a plurality of position limiting devices provided along the direction of conveyance and a selecting device operable to select one of or those of the plurality of position limiting devices which are effective in view of a target position, before a start of conveyance. The selecting device is further operable to select, again, one of or those of the plurality of position limiting devices which are effective in view of the current position of an article being conveyed, after a start of conveyance.
摘要翻译: 传送装置包括沿着传送方向设置的多个位置限制装置,以及选择装置,可操作以在开始传送之前选择在目标位置有效的多个位置限制装置中的一个或那些位置限制装置。 选择装置还可操作以在开始运送之后再次选择多个位置限制装置中的一个或那些位置限制装置中的一个或那些位置限制装置,其在待传送物品的当前位置有效。
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公开(公告)号:US5231291A
公开(公告)日:1993-07-27
申请号:US821888
申请日:1992-01-17
申请人: Mitsuaki Amemiya , Eiji Sakamoto , Koji Uda , Kunitaka Ozawa , Kazunori Iwamoto , Shunichi Uzawa , Mitsuji Marumo
发明人: Mitsuaki Amemiya , Eiji Sakamoto , Koji Uda , Kunitaka Ozawa , Kazunori Iwamoto , Shunichi Uzawa , Mitsuji Marumo
IPC分类号: G03F7/20 , H01L21/00 , H01L21/687
CPC分类号: H01L21/67109 , G03F7/2041 , G03F7/707 , G03F7/70866 , G03F7/70875
摘要: A wafer table includes a wafer holding surface for holding a wafer by attraction; a flow passageway through which a temperature adjusting medium flows to remove any heat in the wafer table; a temperature measuring system for measuring the temperature of the wafer held by the wafer holding surface; a temperature adjusting system disposed between the wafer holding surface and the flow passageway; a temperature setting system for setting a temperature related to the wafer held by the wafer holding surface; a flow rate controlling system for controlling the flow rate of the temperature adjusting medium to be circulated through the flow passageway; and a temperature controlling system for controlling the operation of the temperature adjusting system related to heat, on the basis of a value set by the temperature setting system and a value measured by the temperature measuring system.
摘要翻译: 晶片台包括用于通过吸引保持晶片的晶片保持表面; 流动通道,温度调节介质通过该通道流动以去除晶片台中的任何热量; 用于测量由晶片保持表面保持的晶片的温度的温度测量系统; 设置在晶片保持表面和流动通道之间的温度调节系统; 用于设定与晶片保持面保持的晶片有关的温度的温度设定系统; 流量控制系统,用于控制温度调节介质流过所述流动通道的流量; 以及温度控制系统,用于基于由温度设定系统设定的值和由温度测量系统测量的值来控制与热量相关的温度调节系统的操作。
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