发明授权
US5182230A Laser methods for circuit repair on integrated circuits and substrates
失效
用于集成电路和基板的电路修复的激光方法
- 专利标题: Laser methods for circuit repair on integrated circuits and substrates
- 专利标题(中): 用于集成电路和基板的电路修复的激光方法
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申请号: US223487申请日: 1988-07-25
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公开(公告)号: US5182230A公开(公告)日: 1993-01-26
- 发明人: John J. Donelon , James P. Doyle , Jerry E. Hurst, Jr. , Modest M. Oprysko , Stephen M. Rossnagel , Robert J. von Gutfeld
- 申请人: John J. Donelon , James P. Doyle , Jerry E. Hurst, Jr. , Modest M. Oprysko , Stephen M. Rossnagel , Robert J. von Gutfeld
- 申请人地址: NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: NY Armonk
- 主分类号: H05K3/46
- IPC分类号: H05K3/46 ; H01L21/48 ; H01L21/768 ; H05K3/10 ; H05K3/18 ; H05K3/22
摘要:
The present invention relates to a method of accessing and repairing electrical opens in conducting metal lines on a semiconductor chip or other substrate using laser plating techniques. What has been described is a maskless means of repairing discontinuities in a conductor disposed on the surface of a substrate wherein the surface is locally irradiated to form a reversible carbonaceous layer thereon. This reversible carbonaceous layer acts as a base for electrodeless deposition of a metal to form a bridge across the discontinuity by laser-enhanced exchange plating or other suitable methods. Further, a means of accessing and repairing a discontinuity buried by a cover layer of an insulating or passivating material is described, wherein access to the discontinuity is provided by ablating away the cover layer using a pulsed excimer laser at a first power level.
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