发明授权
US5209835A Method for producing a specified zirconium-silicon amorphous oxide film
composition by sputtering
失效
通过溅射制造特定的锆 - 硅非晶氧化物膜组合物的方法
- 专利标题: Method for producing a specified zirconium-silicon amorphous oxide film composition by sputtering
- 专利标题(中): 通过溅射制造特定的锆 - 硅非晶氧化物膜组合物的方法
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申请号: US489954申请日: 1990-03-07
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公开(公告)号: US5209835A公开(公告)日: 1993-05-11
- 发明人: Ichiro Makino , Akira Mitsui , Mikio Takehara , Eiichi Ando , Junichi Ebisawa , Koichi Suzuki , Kiyoshi Matsumoto , Toru Iseda , Susumu Suzuki
- 申请人: Ichiro Makino , Akira Mitsui , Mikio Takehara , Eiichi Ando , Junichi Ebisawa , Koichi Suzuki , Kiyoshi Matsumoto , Toru Iseda , Susumu Suzuki
- 申请人地址: JPX Tokyo
- 专利权人: Asahi Glass Company Ltd.
- 当前专利权人: Asahi Glass Company Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX63-48765 19880303; JPX63-76202 19880331; JPX63-144827 19880614; JPX63-264163 19881021; JPX1-53009 19890307; JPX2-47138 19900301
- 主分类号: B32B17/10
- IPC分类号: B32B17/10 ; C03C17/23 ; C03C17/245 ; C03C17/25 ; C03C17/34 ; C03C17/36 ; C23C14/08 ; C23C14/34 ; G02B1/10 ; G11B5/72
摘要:
A magnetic recording medium comprising a magnetic recording layer and at least one protective layer formed on the recording layer, wherein the outermost protective layer on the side exposed to air is made of an oxide film.
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