Image forming apparatus provided with a re-supply stacking means
    1.
    发明授权
    Image forming apparatus provided with a re-supply stacking means 失效
    具有再供给堆叠装置的图像形成装置

    公开(公告)号:US6085065A

    公开(公告)日:2000-07-04

    申请号:US47223

    申请日:1998-03-25

    Applicant: Eiichi Ando

    Inventor: Eiichi Ando

    CPC classification number: G03G15/231

    Abstract: An image forming apparatus has a re-supply stacker for reversing a front surface and a rear surface of a sheet and temporarily stacking sheets so that a sheet having one surface on which an image was formed by an image forming unit is re-supplied to the image forming unit, a sheet conveyer for reversing a front surface and a rear surface of a sheet and conveying the sheet to the re-supply stacker, a shifter for shifting the sheet discharged from the sheet conveyer onto the re-supply stacker to abut the sheet against a regulation unit for regulating a position of the sheet, and a controller for controlling so that a shift amount of the shifter is changed.

    Abstract translation: 图像形成装置具有用于反转纸张的前表面和后表面的再供纸堆叠器,并且临时地堆叠纸张,使得具有由图像形成单元形成图像的一个表面的纸张被重新供应到 图像形成单元,用于反转片材的前表面和后表面并将片材输送到再供给堆垛机的片材输送器;移位器,用于将从片材输送器排出的片材移动到再供给堆垛机上以抵靠 片材抵靠用于调节片材位置的调节单元,以及控制器,用于改变移位器的移动量。

    Low emissivity film
    10.
    发明授权
    Low emissivity film 失效
    低辐射膜

    公开(公告)号:US5419969A

    公开(公告)日:1995-05-30

    申请号:US799306

    申请日:1991-11-27

    Abstract: A low emissivity film formed on a substrate, which comprises a coating of oxide films and films whose major component is Ag alternately formed on the substrate in a total of (2n+1) layers where n is an integer being equal to or more than 1, with the innermost layer being an oxide film, wherein an integral width .beta.i(.degree.) of (111) diffraction line of a cubic Ag in an X-ray diffraction diagram of the low emissivity film exists in a first range of 180.lambda./(d.pi.cos.theta.).ltoreq..beta.i.ltoreq.180.pi./(d.pi.cos.theta.)+0.15, where d(.ANG.) designates a thickness of a film whose major component is Ag, .pi.(.ANG.), a wave length of an X-ray for measurement and .theta., Bragg angle.

    Abstract translation: 在衬底上形成的低辐射率膜,其包括主要成分为Ag的氧化膜和膜的涂层,其总共在(2n + 1)层中形成在衬底上,其中n是等于或大于1的整数 ,其中最内层是氧化物膜,其中在低辐射率膜的X射线衍射图中立方体Ag的(111)衍射线的整体宽度βi(DEG)存在于180λ/ (d picosθ)

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