Abstract:
An image forming apparatus has a re-supply stacker for reversing a front surface and a rear surface of a sheet and temporarily stacking sheets so that a sheet having one surface on which an image was formed by an image forming unit is re-supplied to the image forming unit, a sheet conveyer for reversing a front surface and a rear surface of a sheet and conveying the sheet to the re-supply stacker, a shifter for shifting the sheet discharged from the sheet conveyer onto the re-supply stacker to abut the sheet against a regulation unit for regulating a position of the sheet, and a controller for controlling so that a shift amount of the shifter is changed.
Abstract:
A functional product having a transparent oxide layer and a silver layer alternately laminated on a transparent substrate in a total number of (2n+1) layers, where n.gtoreq.1, wherein an oxide film whose major component is an oxide containing tin and silicon, is formed on the outermost layer.
Abstract:
An amorphous oxide film composed essentially of an oxide containing at least one member selected from the group consisting of Zr, Ti, Hf, Sn, Ta and In and at least one member selected from the group consisting of B and Si.
Abstract:
A magnetic recording medium comprising a magnetic recording layer and at least one protective layer formed on the recording layer, wherein the outermost protective layer on the side exposed to air is made of an oxide film.
Abstract:
A laminated glass structure comprises two glass sheets, a plastic layer arranged at the bonding surface of one of the glass sheets, and a functioning layer consisting of single- or multi-layered films provided on the bonding surface of the glass sheet to the plastic layer, wherein the functioning layer has a film having an energy gap of 4 electron volts or higher which is in contact with the plastic layer.
Abstract:
A magnetic recording medium comprising a magnetic recording layer and at least one protective layer formed on the recording layer, wherein the outermost protective layer on the side exposed to air is made of an oxide film.
Abstract:
An amorphous oxide film composed essentially of an oxide containing at least one member selected from the group consisting of Zr, Ti, Hf, Sn, Ta and In and at least one member selected from the group consisting of B and Si.
Abstract:
A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.
Abstract:
A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction.
Abstract:
A low emissivity film formed on a substrate, which comprises a coating of oxide films and films whose major component is Ag alternately formed on the substrate in a total of (2n+1) layers where n is an integer being equal to or more than 1, with the innermost layer being an oxide film, wherein an integral width .beta.i(.degree.) of (111) diffraction line of a cubic Ag in an X-ray diffraction diagram of the low emissivity film exists in a first range of 180.lambda./(d.pi.cos.theta.).ltoreq..beta.i.ltoreq.180.pi./(d.pi.cos.theta.)+0.15, where d(.ANG.) designates a thickness of a film whose major component is Ag, .pi.(.ANG.), a wave length of an X-ray for measurement and .theta., Bragg angle.
Abstract translation:在衬底上形成的低辐射率膜,其包括主要成分为Ag的氧化膜和膜的涂层,其总共在(2n + 1)层中形成在衬底上,其中n是等于或大于1的整数 ,其中最内层是氧化物膜,其中在低辐射率膜的X射线衍射图中立方体Ag的(111)衍射线的整体宽度βi(DEG)存在于180λ/ (d picosθ) = beta i = 180 pi /(d picosθ)+0.15,其中d(ANGSTROM)表示主要成分为Ag,pI(ANGSTROM),波 用于测量的X射线的长度和θ,布拉格角。