发明授权
- 专利标题: Water developable photosensitive resin composition
- 专利标题(中): 水可溶性光敏树脂组合物
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申请号: US530171申请日: 1990-05-29
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公开(公告)号: US5230987A公开(公告)日: 1993-07-27
- 发明人: Toshitaka Kawanami , Yasushi Umeda , Norihisa Osaka
- 申请人: Toshitaka Kawanami , Yasushi Umeda , Norihisa Osaka
- 申请人地址: JPX Osaka JPX Tokyo
- 专利权人: Nippon Paint Co. Ltd.,Mitsubishi Rayon Co., Ltd.
- 当前专利权人: Nippon Paint Co. Ltd.,Mitsubishi Rayon Co., Ltd.
- 当前专利权人地址: JPX Osaka JPX Tokyo
- 优先权: JPX1-134374 19890526
- 主分类号: C08L33/04
- IPC分类号: C08L33/04 ; C08L33/06 ; C08L33/08 ; C08L33/10 ; G03F7/00 ; G03F7/027
摘要:
Disclosed is a water developable photosensitive resin composition suitable for a printing plate, which has excellent dimensional stability and excellent chemical and physical properties. The photosensitive resin composition comprises;(A) an acrylic resin of which glass transition temperature (T.sub.g), as defined by ##EQU1## [wherein T.sub.g1, T.sub.g2, . . . represents a glass transition temperature of a homopolymer prepared from each monomer, T.sub.g0 represents a glass transition temperature of a copolymer and W.sub.1, W.sub.2, . . . shows a weight fraction of each monomer.] and acid value (AV) satisfy the following relations;60.degree. C..ltoreq.T.sub.g .ltoreq.125.degree. C.80 mg KOH/g.ltoreq.AV.ltoreq.130 mg KOH/g, andT.sub.g -10.ltoreq.AV.ltoreq.T.sub.g +40(B) a basic nitrogen atom-containing compound(C) an ethylenically unsaturated monomer, and(D) a photopolymerization initiator.
公开/授权文献
- US5754632A Management of communications networks 公开/授权日:1998-05-19
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