发明授权
- 专利标题： Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography
- 专利标题（中）： 具有固有光吸收性能的聚合物，用于深紫外光刻中的抗反射涂层应用
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申请号： US835715申请日： 1992-02-12
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公开(公告)号： US5234990A公开(公告)日： 1993-08-10
- 发明人: Tony Flaim , James Lamb, III , Kimberly A. Moeckli , Terry Brewer
- 申请人： Tony Flaim , James Lamb, III , Kimberly A. Moeckli , Terry Brewer
- 申请人地址： MO Rolla
- 专利权人： Brewer Science, Inc.
- 当前专利权人： Brewer Science, Inc.
- 当前专利权人地址： MO Rolla
- 主分类号： C08G18/38
- IPC分类号： C08G18/38 ; C08G75/23 ; C08G83/00 ; C08J3/09 ; G03F7/09
摘要：
A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
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